Healing of particulate allografts mixed with platelet concentrates in ridge preservation and sinus lift: a prospective histomorphometric study von Wardani, A, Tran, B, Duterre, M, Larabi, I, Waskiewicz, K, Louryan, S, Evrard, L

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Evaluation of the preoperative pre-bending of titanium mesh on a model obtained by 3D printing for treatment of orbital floor fractures : a systematic review of the literature and... von Engels, T, Waskiewicz, K, Glineur, R, Oth, O

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Risk factors generally neglected in oral surgery and implantology: the high LDL-cholesterol and the insufficient level of vitamin D von Waskiewicz, K, Oth, O, Kochan, N, Evrard, L

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Performance of an image adjustment device for SCALPEL von Waskiewicz, W.K.

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INTERFACE IMPERFECTIONS IN METAL/SI MULTILAYERS von WINDT, DL, HULL, R, WASKIEWICZ, WK

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Surface finish requirements for soft x-ray mirrors von Windt, D L, Waskiewicz, W K, Griffith, J E

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Monte Carlo study of high performance resists for SCALPEL nanolithography von Ocola, L.E., Li, W-Y., Kasica, R.J., Blakey, M.I., Orphanos, P.A., Waskiewicz, W.K., Novembre, A.E., Sato, M.

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Variation in stress with background pressure in sputtered Mo/Si multilayer films von Windt, D. L., Brown, W. L., Volkert, C. A., Waskiewicz, W. K.

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Global space charge effect in SCALPEL von Mkrtchyan, M., Munro, E., Liddle, J.A., Stanton, S.T., Waskiewicz, W.K., Farrow, R.C., Katsap, V.

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Marks for SCALPEL ® tool optics optimization von Farrow, R.C., Gallatin, G.M., Waskiewicz, W.K., Liddle, J.A., Kizilyalli, I., Kornblit, A., Biddick, C., Blakey, M., Klemens, F., Felker, J., Kraus, J., Mkrtchyan, M., Orphanos, P.A., Layadi, N., Merchant, S.

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Diffraction-limited soft-x-ray projection imaging using a laser plasma source von TICHENOR, D. A, KUBIAK, G. D, TENNANT, D. M, BJORKHOLM, J. E, MACDOWELL, A. A, BOKOR, J, JEWELL, T. E, WHITE, D. L, WINDT, D. L, WASKIEWICZ, W. K, MALINOWSKI, M. E, STULEN, R. H, HANEY, S. J, BERGER, K. W, BROWN, L. A, FREEMAN, R. R, MANSFIELD, W. M, WOOD, O. R

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An object pattern post-processor for validation of electron optical modelling von Munro, E., Zhu, X., Liu, H., Rouse, J.A., Waskiewicz, W.K.

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STRESS-RELAXATION IN MO/SI MULTILAYER STRUCTURES von KOLA, RR, WINDT, DL, WASKIEWICZ, WK, WEIR, BE, HULL, R, CELLER, GK, VOLKERT, CA

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Optimization of a SCALPEL ® exposure tool using a diffractive image quality technique von Eichner, L., Blakey, M.I., Farrow, R.C., Liddle, J.A., Orphanos, P.A., Waskiewicz, W.K.

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Mask technologies for soft-x-ray projection lithography at 13 nm von Tennant, D M, Fetter, L A, Harriott, L R, Macdowell, A A, Mulgrew, P P, Pastalan, J Z, Waskiewicz, W K, Windt, D L, Wood Ii, O R

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Analysis of a SCALPEL™ multi-pass writing strategy von Zhu, X., Munro, E., Rouse, J.A., Liu, H., Waskiewicz, W.K.

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Ordering at Si(111)/a-Si and Si(111)/SiO2 interfaces von ROBINSON, I. K, WASKIEWICZ, W. K, TUNG, R. T, BOHR, J

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CMOS compatible alignment marks for the SCALPEL proof of lithography tool von Farrow, R.C., Waskiewicz, W.K., Kizilyalli, I., Ocola, L., Felker, J., Biddick, C., Gallatin, G., Mkrtchyan, M., Blakey, M., Kraus, J., Novembre, A., Orphanos, P., Peabody, M., Kasica, R., Kornblit, A., Klemens, F.

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Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis von Waskiewicz, W.K., Harriott, L.R., Liddle, J.A., Stanton, S.T., Berger, S.D., Munro, E., Zhu, X.

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Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL) von Liddle, J.A., Blakey, M.I., Knurek, C.S., Mkrtchyan, M.M., Novembre, A.E., Ocola, L., Saunders, T., Waskiewicz, W.K.

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