Plasma etching uniformity control for making large and thick dual-focus zone plates von Chen, Lei, Wang, Quandou, Griesmann, Ulf

Volltext

Binary amplitude holograms made from dyed photoresist von QUANDOU WANG, GRIESMANN, Ulf, BURNETT, John H

Volltext

Modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers von Park, Jungjae, Chen, Lingfeng, Wang, Quandou, Griesmann, Ulf

Volltext

Holographic radius test plates for spherical surfaces with large radius of curvature von Wang, Quandou, Griesmann, Ulf, Soons, Johannes A

Volltext

Optical Flatness Metrology for 300 mm Silicon Wafers von Griesmann, Ulf, Wang Quandou, Raymond, Thomas D.

Volltext

Deformation-free form error measurement of thin, plane-parallel optics floated on a heavy liquid von Chu, Jiyoung, Griesmann, Ulf, Wang, Quandou, Soons, Johannes A, Benck, Eric C

Volltext

Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variation von Griesmann, Ulf, Wang, Quandou, Tricard, Marc, Dumas, Paul, Hall, Christopher

Volltext