Revolutionary and evolutionary resist design concepts for 193 nm lithography von Nalamasu, O., Wallow, T.I., Reichmanis, E., Novembre, A.E., Houlihan, F.M., Dabbagh, G., Mixon, D.A., Hutton, R.S., Timko, A.G., Wood, O.R., Cirelli, R.A.

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