Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging von Houlihan, F. M., Wallow, T. I., Nalamasu, O., Reichmanis, E.

Volltext

Highly Efficient and Accelerated Suzuki Aryl Couplings Mediated by Phosphine-Free Palladium Sources von Wallow, Thomas I, Novak, Bruce M

Volltext

Application of “Transfer-Free” Suzuki Coupling Protocols toward the Synthesis of “Unambiguously Linear” Poly(p-phenylenes) von Goodson, Felix E, Wallow, Thomas I, Novak, Bruce M

Volltext

In aqua synthesis of water-soluble poly(p-phenylene) derivatives von Wallow, Thomas I, Novak, Bruce M

Volltext

Low-distortion, high-strength bonding of thermoplastic microfluidic devices employing case-II diffusion-mediated permeant activation von Wallow, Thomas I, Morales, Alfredo M, Simmons, Blake A, Hunter, Marion C, Krafcik, Karen Lee, Domeier, Linda A, Sickafoose, Shane M, Patel, Kamlesh D, Gardea, Andy

Volltext

A Commercially Viable 193 nm Single Layer Resist Platform von Houlihan, F.M., Wallow, T., Timko, A., Neria, E., Hutton, R., Cirelli, R., Kometani, J. M., Nalamasu, O., Reichmanis, E.

Volltext

Revolutionary and evolutionary resist design concepts for 193 nm lithography von Nalamasu, O., Wallow, T.I., Reichmanis, E., Novembre, A.E., Houlihan, F.M., Dabbagh, G., Mixon, D.A., Hutton, R.S., Timko, A.G., Wood, O.R., Cirelli, R.A.

Volltext

IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance von Varanasi, P. Rao, Mewherter, A. M., Lawson, M. C., Jordhamo, G., Allen, R., Opitz, J., Ito, H., Wallow, T., Hofer, D.

Volltext

Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance von Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., Larson, C. E., Sooriyakumaran, R., Hofer, D. C., Varanasi, P. R.

Volltext

Mechanistic Studies on the Aryl−Aryl Interchange Reaction of ArPdL2I (L = Triarylphosphine) Complexes von Goodson, Felix E, Wallow, Thomas I, Novak, Bruce M

Volltext

A Commercially Viable 193nm Single Layer Resist Platform von Houlihan, F.M., Wallow, T., Timko, A., Neria, E., Hutton, R., Cirelli, R., Kometani, J. M., Nalamasu, O., Reichmanis, E.

Volltext

Novel Classes of Cyclic Olefin Polymers for 193nm Lithography von Varanasi, P. Rao, Allen, R.D., Ito, H., Wallow, T, Truong, H., Chen, R., Lawson, P., Li, W., Brunsvold, B., Jordhamo, G., Kwong, R., Kajita, T., Nishimura, Y., Slezak, M., Peterson, W., Koshiba, M.

Volltext

Extreme ultraviolet lithography based nanofabrication using a bilevel photoresist von Talin, A. A., Cardinale, G. F., Wallow, T. I., Dentinger, P., Pathak, S., Chinn, D., Folk, D. R.

Volltext

Process optimization of templated DSA flows von Gronheid, Roel, Bekaert, Joost, Kuppuswamy, Vijaya-Kumar Murugesan, Vandenbroeck, Nadia, Doise, Jan, Cao, Yi, Lin, Guanyang, Sayan, Safak, Parnell, Doni, Somervell, Mark

Volltext

Dual-purpose vias for use in ceramic pedestals von Wallow Electric Manufacturing Company

Volltext bestellen

IBM 193nm Semiconductor Resist von Rao Varanasi, P, M. Mewherter, A, C. Lawson, M, Jordhamo, G, Allen, R, Opitz, J, Ito, H, Wallow, T, Hofer, D

Volltext

Photoresist challenges and potential solutions for the 32 nm half-pitch node and beyond von Wurm, S., Byers, J., Zimmerman, P., Wallow, T., Dean, K.

Volltext bestellen

ACCELERATED SUZUKI COUPLING VIA A LIGANDLESS PALLADIUM CATALYST: 4-METHOXY-2'-METHYLBIPHENYL

Volltext

Are extreme ultraviolet resists ready for the 32 nm node? von Petrillo, Karen, Wei, Yayi, Brainard, R., Denbeaux, G., Goldfarb, Dario, Koay, C.-S., Mackey, J., Montgomery, Warren, Pierson, W., Wallow, T., Wood, Obert

Volltext

Are extreme ultraviolet resists ready for the 32nm node? von Petrillo, Karen, Wei, Yayi, Brainard, R., Denbeaux, G., Goldfarb, Dario, Koay, C.-S., Mackey, J., Montgomery, Warren, Pierson, W., Wallow, T., Wood, Obert

Volltext