Nucleation of Trace Copper on the H−Si(111) Surface in Aqueous Fluoride Solutions von Homma, Takayuki, Wade, Christopher P, Chidsey, Christopher E. D

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Etch-pit initiation by dissolved oxygen on terraces of H-Si(111) von Wade, Christopher P., Chidsey, Christopher E. D.

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Erratum: “Etch-pit initiation by dissolved oxygen on terraces of H–Si(111)” [Appl. Phys. Lett. 71 , 1679 (1997)] von Wade, Christopher P., Chidsey, Christopher E. D.

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Bioreactive Self-Assembled Monolayers on Hydrogen-Passivated Si(111) as a New Class of Atomically Flat Substrates for Biological Scanning Probe Microscopy von Wagner, Peter, Nock, Steffen, Spudich, James A., Volkmuth, Wayne D., Chu, Steve, Cicero, Ronald L., Wade, Christopher P., Linford, Matthew R., Chidsey, Christopher E.D.

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Sorption of methylene chloride vapor in polyimide films von Moylan, Christopher R, Wade, Christopher P, Swanson, Sally A, Best, Margaret E

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Micro-contact CSP von Moran, Sean, Solberg, Vern, Wade, Christopher P

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Micro Copper Contacts Replace BGA, Improve Reliability von Wade, Christopher P, Moran, Sean P

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Electronic device on substrate with cavity and mitigated parasitic leakage path von Fazzio, R. Shane, Ruby, Richard C, Wade, Christopher P, Frank, Michael Louis, Feld, David A

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Electronic device on substrate with cavity and mitigated parasitic leakage path von FAZZIO R. SHANE, RUBY RICHARD C, FELD DAVID A, WADE CHRISTOPHER P, FRANK MICHAEL LOUIS

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ELECTRONIC DEVICE ON SUBSTRATE WITH CAVITY AND MITIGATED PARASITIC LEAKAGE PATH von FAZZIO R. SHANE, RUBY RICHARD C, FELD DAVID A, WADE CHRISTOPHER P, FRANK MICHAEL LOUIS

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Electronic device on substrate with cavity and mitigated parasitic leakage path von Fazzio, R. Shane, Ruby, Richard C, Wade, Christopher P, Frank, Michael Louis, Feld, David A

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Electronic device on substrate with cavity and mitigated parasitic leakage path von FAZZIO R. SHANE, RUBY RICHARD C, FELD DAVID A, WADE CHRISTOPHER P, FRANK MICHAEL LOUIS

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Chemical vapor deposition of ruthenium films for metal electrode applications von PAO, ELAINE, ZHAO, JUN, WANG, YAXIN, WADE, CHRISTOPHER P

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Electronic device on substrate with cavity and mitigated parasitic leakage path von RUBY RICHARD C, FELD DAVID A, WADE CHRISTOPHER P, FAZZIO R. S, FRANK MICHAEL L

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Chemical vapor deposition of ruthenium films for metal electrode applications von WADE CHRISTOPHER P, PAO ELAINE, ZHAO JUN, WANG YAXIN

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Chemical vapor deposition of ruthenium films for metal electrode applications von WADE CHRISTOPHER P, PAO ELAINE, ZHAO JUN, WANG YAXIN

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Chemical vapor deposition of ruthenium films for metal electrode applications von Wade, Christopher P, Pao, Elaine, Wang, Yaxin, Zhao, Jun

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CHEMICAL VAPOR DEPOSITION OF RUTHENIUM FILM FOR METAL ELECTRODE APPLICATION von WADE CHRISTOPHER P, PAO ELAINE, ZHAO JUN, WANG YAXIN

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Chemical vapor deposition of ruthemium films von PAO, ELAINE, ZHAO, JUN, WANG, YAXIN, WADE, CHRISTOPHER P

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CVD ruthenium seed for CVD ruthenium deposition von WADE CHRISTOPHER P, PAO ELAINE, ZHAO JUN, TAO XIANZHI, JIN XIAOLIANG, WANG YAXIN

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