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Image Texture Analysis and Application to Acicular Mullite Porous Ceramic Microstructure von Todd, Clifford S, Heeschen, William A

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Solution and solid carbon-13 magnetic resonance study of the conformation of 9,10-dihydroanthracene and its 9,10-methylated derivatives von Dalling, Don K, Zilm, Kurt W, Grant, David M, Heeschen, William A, Horton, W. James, Pugmire, Ronald J

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DEVICE AND METHOD FOR ANALYZING ABRASIVE LAYER von JEFF TSAI, SWEE-TENG CHIN, MARK GAZZE, WILLIAM A HEESCHEN, JAMES DAVID TATE, SCOTT CHANG, FRANCIS V ACHOLLA, WANK ANDREW R, LEO H CHIANG

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A POLISHING LAYER ANALYZER AND METHOD von FRANCIS V. ACHOLLA, JEFF TSAI, ANDREW WANK, MARK GAZZE, SWEE TENG CHIN, JAMES DAVID TATE, LEO H. CHIANG, SCOTT CHANG, WILLIAM A. HEESCHEN

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CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD von JEFF TSAI, SWEE-TENG CHIN, MARK GAZZE, WILLIAM A HEESCHEN, JAMES DAVID TATE, SCOTT CHANG, FRANCIS V ACHOLLA, WANK ANDREW R, LEO H CHIANG

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FILTER AND MEMBRANE DEFECT DETECTION SYSTEM von HEESCHEN, WILLIAM, A, WOOD, STEWART, P

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METHOD FOR THE PRODUCTION OF CHEMICAL MECHANICAL POLISHING PAD von JEFF TSAI, SWEE-TENG CHIN, MARK GAZZE, WILLIAM A HEESCHEN, JAMES DAVID TATE, SCOTT CHANG, FRANCIS V ACHOLLA, WANK ANDREW R, LEO H CHIANG

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METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS von FRANCIS V. ACHOLLA, ANDREW WANK, JEFF TSAI, MARK GAZZE, SWEE TENG CHIN, JAMES DAVID TATE, LEO H. CHIANG, SCOTT CHANG, WILLIAM A. HEESCHEN

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A CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD von FRANCIS V. ACHOLLA, ANDREW WANK, JEFF TSAI, MARK GAZZE, SWEE TENG CHIN, JAMES DAVID TATE, LEO H. CHIANG, SCOTT CHANG, WILLIAM A. HEESCHEN

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FILTER AND MEMBRANE DEFECT DETECTION SYSTEM von WOOD STEWART P, HEESCHEN WILLIAM A

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FILTER AND MEMBRANE DEFECT DETECTION SYSTEM von HEESCHEN, WILLIAM, A, WOOD, STEWART, P

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FILTER AND MEMBRANE DEFECT DETECTION SYSTEM von HEESCHEN, WILLIAM A, WOOD, STEWART P

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