Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates von Di Giacomo, Francesco, Zardetto, Valerio, D'Epifanio, Alessandra, Pescetelli, Sara, Matteocci, Fabio, Razza, Stefano, Di Carlo, Aldo, Licoccia, Silvia, Kessels, Wilhelmus M. M., Creatore, Mariadriana, Brown, Thomas M.

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From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity von Mackus, Adriaan J. M, Merkx, Marc J. M, Kessels, Wilhelmus M. M

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Surface passivation of germanium by atomic layer deposited Al2O3 nanolayers von Berghuis, Wilhelmus J. H., Melskens, Jimmy, Macco, Bart, Theeuwes, Roel J., Verheijen, Marcel A., Kessels, Wilhelmus M. M.

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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies von Faraz, Tahsin, Knoops, Harm C. M, Verheijen, Marcel A, van Helvoirt, Cristian A. A, Karwal, Saurabh, Sharma, Akhil, Beladiya, Vivek, Szeghalmi, Adriana, Hausmann, Dennis M, Henri, Jon, Creatore, Mariadriana, Kessels, Wilhelmus M. M

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Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 von Arts, Karsten, Thepass, Harvey, Verheijen, Marcel A, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M

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On the role of the Agulhas system in ocean circulation and climate von Beal, Lisa M., De Ruijter, Wilhelmus P. M., Biastoch, Arne, Zahn, Rainer

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Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity von Merkx, Marc J. M, Vlaanderen, Sander, Faraz, Tahsin, Verheijen, Marcel A, Kessels, Wilhelmus M. M, Mackus, Adriaan J. M

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Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle von Mameli, Alfredo, Merkx, Marc J. M, Karasulu, Bora, Roozeboom, Fred, Kessels, Wilhelmus (Erwin) M. M, Mackus, Adriaan J. M

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Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In2O3:H Prepared by Atomic Layer Deposition von Macco, Bart, Knoops, Harm C. M, Kessels, Wilhelmus M. M

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Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers von Andringa, Anne-Marije, Perrotta, Alberto, de Peuter, Koen, Knoops, Harm C. M, Kessels, Wilhelmus M. M, Creatore, Mariadriana

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Status and prospects of plasma-assisted atomic layer deposition von Knoops, Harm C. M., Faraz, Tahsin, Arts, Karsten, Kessels, Wilhelmus M. M. (Erwin)

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Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution von Balasubramanyam, Shashank, Shirazi, Mahdi, Bloodgood, Matthew A, Wu, Longfei, Verheijen, Marcel A, Vandalon, Vincent, Kessels, Wilhelmus M. M, Hofmann, Jan P, Bol, Ageeth A

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Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation von Singh, Joseph A, Thissen, Nick F. W, Kim, Woo-Hee, Johnson, Hannah, Kessels, Wilhelmus M. M, Bol, Ageeth A, Bent, Stacey F, Mackus, Adriaan J. M

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Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells von Koushik, Dibyashree, Jošt, Marko, Du inskas, Algirdas, Burgess, Claire, Zardetto, Valerio, Weijtens, Christ, Verheijen, Marcel A, Kessels, Wilhelmus M. M, Albrecht, Steve, Creatore, Mariadriana

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Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography von Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A, Macco, Bart, Prosa, Ty J, Larson, David J, Roozeboom, Fred, Kessels, Wilhelmus M. M

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Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 von Arts, Karsten, Utriainen, Mikko, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M

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Evidence of Abrupt Transitions Between Sea Ice Dynamical Regimes in the East Greenland Marginal Ice Zone von Watkins, Daniel M., Bliss, Angela C., Hutchings, Jennifer K., Wilhelmus, Monica M.

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Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2 von Arts, Karsten, Deijkers, Sanne, Puurunen, Riikka L, Kessels, Wilhelmus M. M, Knoops, Harm C. M

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Excellent passivation of germanium surfaces by POx/Al2O3 stacks von Theeuwes, Roel J., Berghuis, Wilhelmus J. H., Macco, Bart, Kessels, Wilhelmus M. M.

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Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride von Ande, Chaitanya Krishna, Knoops, Harm C. M, de Peuter, Koen, van Drunen, Maarten, Elliott, Simon D, Kessels, Wilhelmus M. M

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