PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM von Moors, Johannes Hubertus Josephina, Wieggers, Rob Carlo, Leenders, Martinus Hendrikus Antonius, Duarte Rodrigues Nunes, Rui Miguel, Ma, Yue, Korkmaz, Celal, Westerlaken, Jan Steven Christiaan, Van Drent, William Peter, Zhu, Qiushi, Van De Wiel, Hubertus Johannes, Hummler, Klaus Martin, Brizuela, Fernando, Van Dijck, Hendrikus Alphonsus Ludovicus, Ershov, Alexander Igorevich, Laforge, Andrew David, Rommers, Jeroen Hubert, Jacobs, Johannes Henricus Wilhelmus, Kuznetsov, Alexey Sergeevich, Kempen, Antonius Theodorus Wilhelmus, Gomes, Umesh Prasad, Kim, Alexander Downn, Nedanovska, Elena, Liu, Fei, Jonkers, Peter Gerardus, Fomenkov, Igor Vladimirovich, Yaghoobi, Parham

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Prolonging optical element lifetime in an EUV lithography system von Moors, Johannes Hubertus Josephina, Wieggers, Rob Carlo, Leenders, Martinus Hendrikus Antonius, Duarte Rodrigues Nunes, Rui Miguel, Ma, Yue, Korkmaz, Celal, Westerlaken, Jan Steven Christiaan, Van Drent, William Peter, Zhu, Qiushi, Van De Wiel, Hubertus Johannes, Hummler, Klaus Martin, Brizuela, Fernando, Van Dijck, Hendrikus Alphonsus Ludovicus, Ershov, Alexander Igorevich, Laforge, Andrew David, Rommers, Jeroen Hubert, Jacobs, Johannes Henricus Wilhelmus, Kuznetsov, Alexey Sergeevich, Kempen, Antonius Theodorus Wilhelmus, Gomes, Umesh Prasad, Kim, Alexander Downn, Nedanovska, Elena, Liu, Fei, Jonkers, Peter Gerardus, Fomenkov, Igor Vladimirovich, Yaghoobi, Parham

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PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM von Moors, Johannes Hubertus Josephina, Wieggers, Rob Carlo, Leenders, Martinus Hendrikus Antonius, Duarte Rodrigues Nunes, Rui Miguel, Ma, Yue, Korkmaz, Celal, Westerlaken, Jan Steven Christiaan, Van Drent, William Peter, Zhu, Qiushi, Van De Wiel, Hubertus Johannes, Hummler, Klaus Martin, Brizuela, Fernando, Van Dijck, Hendrikus Alphonsus Ludovicus, Ershov, Alexander Igorevich, Laforge, Andrew David, Rommers, Jeroen Hubert, Jacobs, Johannes Henricus Wilhelmus, Kuznetsov, Alexey Sergeevich, Kempen, Antonius Theodorus Wilhelmus, Gomes, Umesh Prasad, Kim, Alexander Downn, Nedanovska, Elena, Liu, Fei, Jonkers, Peter Gerardus, Fomenkov, Igor Vladimirovich, Yaghoobi, Parham

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Prolonging optical element lifetime in an EUV lithography system von Moors, Johannes Hubertus Josephina, Wieggers, Rob Carlo, Leenders, Martinus Hendrikus Antonius, Duarte Rodrigues Nunes, Rui Miguel, Ma, Yue, Korkmaz, Celal, Westerlaken, Jan Steven Christiaan, Van Drent, William Peter, Zhu, Qiushi, Van De Wiel, Hubertus Johannes, Hummler, Klaus Martin, Brizuela, Fernando, Van Dijck, Hendrikus Alphonsus Ludovicus, Ershov, Alexander Igorevich, Laforge, Andrew David, Rommers, Jeroen Hubert, Jacobs, Johannes Henricus Wilhelmus, Kuznetsov, Alexey Sergeevich, Kempen, Antonius Theodorus Wilhelmus, Gomes, Umesh Prasad, Kim, Alexander Downn, Nedanovska, Elena, Liu, Fei, Jonkers, Peter Gerardus, Fomenkov, Igor Vladimirovich, Yaghoobi, Parham

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PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM von Moors, Johannes Hubertus Josephina, Wieggers, Rob Carlo, Leenders, Martinus Hendrikus Antonius, Duarte Rodrigues Nunes, Rui Miguel, Ma, Yue, Korkmaz, Celal, Westerlaken, Jan Steven Christiaan, Van Drent, William Peter, Zhu, Qiushi, Van De Wiel, Hubertus Johannes, Hummler, Klaus Martin, Brizuela, Fernando, Van Dijck, Hendrikus Alphonsus Ludovicus, Ershov, Alexander Igorevich, Laforge, Andrew David, Rommers, Jeroen Hubert, Jacobs, Johannes Henricus Wilhelmus, Kuznetsov, Alexey Sergeevich, Kempen, Antonius Theodorus Wilhelmus, Gomes, Umesh Prasad, Kim, Alexander Downn, Nedanovska, Elena, Liu, Fei, Jonkers, Peter Gerardus, Fomenkov, Igor Vladimirovich, Yaghoobi, Parham

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Prolonging optical element lifetime in an EUV lithography system von VAN DE WIEL, HUBERTUS JOHANNES, YAGHOOBI, PARHAM, VAN DRENT, WILLIAM PETER, KORKMAZ, CELAL, LIU, FEI, MA, YUE, HUMMLER, KLAUS MARTIN, ROMMERS, JEROEN HUBERT, VAN DIJCK, HENDRIKUS ALPHONSUS LUDOVICUS, FOMENKOV, IGOR VLADIMIROVICH, NEDANOVSKA, ELENA, JACOBS, JOHANNES HENRICUS WILHELMUS, BRIZUELA, FERNANDO, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, ERSHOV, ALEXANDER IGOREVICH, KEMPEN, ANTONIUS THEODORUS WILHELMUS, WESTERLAKEN, JAN STEVEN CHRISTIAAN, KUZNETSOV, ALEXEY SERGEEVICH, WIEGGERS, ROB CARLO, GOMES, UMESH PRASAD, KIM, ALEXANDER DOWNN, MOORS, JOHANNES HUBERTUS JOSEPHINA, LAFORGE, ANDREW DAVID, JONKERS, PETER GERARDUS, DUARTE RODRIGUES NUNES, RUI MIGUEL, ZHU, QIU-SHI

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PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM von UMESH PRASAD GOMES, JOHANNES HUBERTUS JOSEPHINA MOORS, QIUSHI ZHU, JOHANNES HENRICUS WILHELMUS JACOBS, YUE MA, ALEXANDER DOWNN KIM, HUBERTUS JOHANNES VAN DE WIEL, RUI MIGUEL DUARTE RODRIGES NUNES, MARTINUS HENDRIKUS ANTONIUS LEENDERS, ROB CARLO WIEGGERS, WILLIAM PETER VAN DRENT, CELAL KORKMAZ, PETER GERARDUS JONKERS, JAN STEVEN CHRISTIAAN WESTERLAKEN, FEI LIU, ANTONIUS THEODORUS WILHELMUS KEMPEN, ALEXANDER IGOREVICH ERSHOV, ALEXEY SERGEEVICH KUZNETSOV, KLAUS MARTIN HUMMLER, JEROEN HUBERT ROMMERS, HENDRIKUS ALPHONSUS LUDOVICUS VAN DIJCK, PARHAM YAGHOOBI, IGOR VLADIMIROVICH FOMENKOV, ANDREW DAVID LAFORGE, FERNANDO BRIZUELA, ELENA NEDANOVSKA

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Prolonging optical element lifetime in an euv lithography system von VAN DE WIEL, HUBERTUS JOHANNES, YAGHOOBI, PARHAM, VAN DRENT, WILLIAM PETER, KORKMAZ, CELAL, LIU, FEI, MA, YUE, HUMMLER, KLAUS MARTIN, ROMMERS, JEROEN HUBERT, VAN DIJCK, HENDRIKUS ALPHONSUS LUDOVICUS, FOMENKOV, IGOR VLADIMIROVICH, NEDANOVSKA, ELENA, JACOBS, JOHANNES HENRICUS WILHELMUS, BRIZUELA, FERNANDO, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, ERSHOV, ALEXANDER IGOREVICH, KEMPEN, ANTONIUS THEODORUS WILHELMUS, WESTERLAKEN, JAN STEVEN CHRISTIAAN, ZHU, QIUSHI, KUZNETSOV, ALEXEY SERGEEVICH, WIEGGERS, ROB CARLO, GOMES, UMESH PRASAD, KIM, ALEXANDER DOWNN, MOORS, JOHANNES HUBERTUS JOSEPHINA, LAFORGE, ANDREW DAVID, JONKERS, PETER GERARDUS, DUARTE RODRIGUES NUNES, RUI MIGUEL

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PROLONGING OPTICAL ELEMENT LIFETIME IN EUV LITHOGRAPHY SYSTEM von ZHU QIU-SHI, UMESH PRASAD GOMES, JOHANNES HENRICUS WILHELMUS JACOBS, ALEXANDER DOWNN KIM, HUBERTUS JOHANNES VAN DE WIEL, RUI MIGUEL DUARTE RODRIGES NUNES, ROMMERS JEROEN HUBERT, ROB CARLO WIEGGERS, KEMPEN ANTONIUS THEODORS WILHELMS, CELAL KORKMAZ, JAN STEVEN CHRISTIAAN WESTERLAKEN, ALEXANDER IGOREVICH ERSHOV, ALEXEY SERGEEVICH KUZNETSOV, KLAUS MARTIN HUMMLER, LIU HUI, VAN DRENT WILLIAM PETER, HENDRIKUS ALPHONSUS LUDOVICUS VAN DIJCK, MOORS JOHANNES HUBERTUS JOSEPHINA, PARHAM YAGHOOBI, IGOR VLADIMIROVICH FOMENKOV, ANDREW DAVID LAFORGE, MA YUE, ANTONIUS LEENDERS MARTINUS HENDRIKUS, FERNANDO BRIZUELA, ELENA NEDANOVSKA, JONKERS PETER GERARDUS

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METHOD FOR PROTECTING AN OPTICAL ELEMENT IN A RADIATION SOURCE FOR ELECTROMAGNETIC RADIATION WITH A WAVELENGTH IN THE EXTREME ULTRAVIOLET (XUV) WAVELENGTH RANGE, AND RADIATION SOUR... von GOEDHEER, WILLEM JAN, WIEGGERS, ROB CARLO, BIJKERK, FREDERIK

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EUV 리소그래피 시스템 내에서의 광학 요소 수명 연장 von ERSHOV ALEXANDER IGOREVICH, WESTERLAKEN JAN STEVEN CHRISTIAAN, JACOBS JOHANNES HENRICUS WILHELMUS, ROMMERS JEROEN HUBERT, VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS, YAGHOOBI PARHAM, KEMPEN ANTONIUS THEODORUS WILHELMUS, FOMENKOV IGOR VLADIMIROVICH, KUZNETSOV ALEXEY SERGEEVICH, DUARTE RODRIGUES NUNES RUI MIGUEL, LAFORGE ANDREW DAVID, VAN DRENT WILLIAM PETER, BRIZUELA FERNANDO, WIEGGERS ROB CARLO, KIM ALEXANDER DOWNN, MOORS JOHANNES HUBERTUS JOSEPHINA, GOMES UMESH PRASAD, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MA YUE, ZHU QIUSHI, HUMMLER KLAUS MARTIN, LIU FEI, NEDANOVSKA ELENA, KORKMAZ CELAL, JONKERS PETER GERARDUS, VAN DE WIEL HUBERTUS JOHANNES

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PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM von ZHU QIU-SHI, ERSHOV ALEXANDER IGOREVICH, WESTERLAKEN JAN STEVEN CHRISTIAAN, JACOBS JOHANNES HENRICUS WILHELMUS, ROMMERS JEROEN HUBERT, VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS, YAGHOOBI PARHAM, KEMPEN ANTONIUS THEODORUS WILHELMUS, FOMENKOV IGOR VLADIMIROVICH, KUZNETSOV ALEXEY SERGEEVICH, DUARTE RODRIGUES NUNES RUI MIGUEL, LAFORGE ANDREW DAVID, VAN DRENT WILLIAM PETER, BRIZUELA FERNANDO, WIEGGERS ROB CARLO, KIM ALEXANDER DOWNN, MOORS JOHANNES HUBERTUS JOSEPHINA, GOMES UMESH PRASAD, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MA YUE, HUMMLER KLAUS MARTIN, LIU FEI, NEDANOVSKA ELENA, KORKMAZ CELAL, JONKERS PETER GERARDUS, VAN DE WIEL HUBERTUS JOHANNES

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Prolonging optical element lifetime in an EUV lithography system von VAN DE WIEL, HUBERTUS JOHANNES, YAGHOOBI, PARHAM, VAN DRENT, WILLIAM PETER, KORKMAZ, CELAL, LIU, FEI, MA, YUE, HUMMLER, KLAUS MARTIN, ROMMERS, JEROEN HUBERT, VAN DIJCK, HENDRIKUS ALPHONSUS LUDOVICUS, FOMENKOV, IGOR VLADIMIROVICH, NEDANOVSKA, ELENA, JACOBS, JOHANNES HENRICUS WILHELMUS, BRIZUELA, FERNANDO, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, ERSHOV, ALEXANDER IGOREVICH, KEMPEN, ANTONIUS THEODORUS WILHELMUS, WESTERLAKEN, JAN STEVEN CHRISTIAAN, KUZNETSOV, ALEXEY SERGEEVICH, WIEGGERS, ROB CARLO, GOMES, UMESH PRASAD, KIM, ALEXANDER DOWNN, MOORS, JOHANNES HUBERTUS JOSEPHINA, LAFORGE, ANDREW DAVID, JONKERS, PETER GERARDUS, DUARTE RODRIGUES NUNES, RUI MIGUEL, ZHU, QIU-SHI

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Werkwijze voor het beschermen van een optisch element in een stralingsbron voor elektromagnetische straling met een golflengte in het extreem ultraviolet (XUV) golflengtegebied en... von WILLEM JAN GOEDHEER, FREDERIK BIJKERK, ROB CARLO WIEGGERS

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