Conductivity behavior in polycrystalline semiconductor thin film transistors von Levinson, J., Shepherd, F. R., Scanlon, P. J., Westwood, W. D., Este, G., Rider, M.

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Stable, low-loss optical waveguides and micromirrors fabricated in acrylate polymers von Cook, J P, Este, G O, Shepherd, F R, Westwood, W D, Arrington, J, Moyer, W, Nurse, J, Powell, S

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Oxidation of an aluminum magnetron sputtering target in Ar/O2 mixtures von Maniv, S., Westwood, W. D.

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The current-voltage characteristic of magnetron sputtering systems von WESTWOOD, W. D, MANIV, S, SCANLON, P. J

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Surface oxidation kinetics of sputtering targets von Maniv, S., Westwood, W.D.

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A new method for determining thin-film refractive index and thickness using guided optical waves von Wei, J S, Westwood, W D

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Formation of PtO films by reactive sputtering von Westwood, W. D., Bennewitz, C. D.

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The effect of the earth's magnetic field on auger analysis von Ingrey, S., Westwood, W.D.

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Calculation of the current-voltage-pressure characteristics of dc diode sputtering discharges von Maniv, S., Westwood, W. D., Scanlon, P. J.

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Structural and Electrical Properties of Tantalum Films Sputtered in Oxygen-Argon Mixtures von Westwood, W. D., Waterhouse, Neil

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Detection of sputtered atoms by atomic absorption spectroscopy von Stirling, A J, Westwood, W D

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Single-Crystal Ferrite Films Prepared by Cathodic Sputtering von WESTWOOD, W. D., EASTWOOD, K., POULSEN, R. G., SADLER, A. G.

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Modification of CdSe resistivity by laser annealing von Feenstra, R. M., Parsons, R. R., Shepherd, F. R., Westwood, W. D., Ingrey, S. J.

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X-ray analysis of tantalum films triode-sputtered in argon-oxygen mixtures von Westwood, W.D.

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ORIENTATION EFFECTS IN THE RESISTIVITY OF Ta FILMS SPUTTERED IN OXYGEN von Westwood, W. D.

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Cathode Dark-Space Measurements and Deposition Rates of Tantalum in a Sputtering System von Westwood, W. D., Boynton, R.

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The influence of conducting underlays on the properties of sputtered tantalum films von Westwood, W.D.

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A spectroscopic investigation of the reactive sputtering of aluminium von Stirling, A.J., Westwood, W.D.

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Phase composition and conductivity of sputtered tantalum von Westwood, W.D., Livermore, F.C.

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Investigation of the Sputtering of Aluminum Using Atomic-Absorption Spectroscopy von Stirling, A. J., Westwood, W. D.

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