A model of fluid, heat flow, and electromagnetic phenomena in a nontransferred arc plasma torch von WESTHOFF, R, SZEKELY, J

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Direct regrowth of thin strained silicon films on planarized relaxed silicon–germanium virtual substrates von Leitz, C.W., Vineis, C.J., Carlin, J., Fiorenza, J., Braithwaite, G., Westhoff, R., Yang, V., Carroll, M., Langdo, T.A., Matthews, K., Kohli, P., Rodder, M., Wise, R., Lochtefeld, A.

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Arc characteristics in gas-metal arc welding of aluminum using argon at the shielding gas von JÖNSSON, P. G, WESTHOFF, R. C, SZEKELY, J

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Parasitic resistance considerations of using elevated source/drain technology for deep submicron metal oxide semiconductor field effect transistors von SUN, J, BARTHOLOMEW, R. F, BELLUR, K, SRIVASTAVA, A, OSBURN, C. M, MASNARI, N. A, WESTHOFF, R

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Starch-based blown films. 2 von Otey, Felix H, Westhoff, Richard P, Doane, William M

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Strained Si/SiGe quantum well MODFETs for cryogenic circuit applications von Rack, M.J., Thornton, T.J., Ferry, D.K., Huffman, J., Westhoff, R.

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Crystalline-to-amorphous transition in chemical vapor deposition of pseudomorphic Si1−x−yGexCy films von Laursen, T., Chandrasekhar, D., Smith, David J., Mayer, J. W., Huffman, J., Westhoff, R., Robinson, McD

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A comparative study of n+/p junction formation for deep submicron elevated source/drain metal oxide semiconductor field effect transistors von SUN, J, BARTHOLOMEW, R. F, BELLUR, K, SRIVASTAVA, A, OSBURN, C. M, MASNARI, N. A, WESTHOFF, R

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A comparison of experimental measurements and theoretical predictions regarding the behavior of a turbulent argon plasma jet discharging into air von DILAWARI, A. H, SZEKELY, J, WESTHOFF, R

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A high throughput, ultra-low roughness, SiGe-free strained Si regrowth process von Leitz, Christopher, Yang, Vicky, Carroll, Mark, Langdo, Thomas, Westhoff, Richard, Vineis, Christopher, Bulsara, Mayank

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Reduction and activity of the metathesis catalyst WO3/SiO2 von WESTHOFF, R

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Linear Trends in Northern Hemisphere Tropospheric Geopotential Height and Temperature Patterns von Reiter, Elmar R., Westhoff, Daniel R.

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Determination of optical constants of strained Si1−xGex epitaxial layers in the spectral range 0.75–2.75 eV von Chen, Weize, Westhoff, Richard, Reif, Rafael

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Starch-polyvinyl alcohol films - effect of various plasticizers von Westhoff, R.P, Kvolek, W.F, Otey, F.H. (Agricultural Research, Science and Education Administration, Peoria, Ill. (USA). Northern Region, Research Center)

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Characterization of strained silicon quantum wells and Si1-xGex heterostructures using Auger electron spectroscopy and spreading resistance profiles of bevelled structures von Rack, M J, Thornton, T J, Ferry, D K, Roberts, Jeff, Westhoff, Richard

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Infrared waveguiding in Si(1-x-y)Ge(x)C(y) upon silicon von Soref, R A, Atzman, Z, Shaapur, F, Robinson, M, Westhoff, R

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Light care residents in nursing homes: why they come, why they stay von Grando, V T, Mehr, D, Popejoy, L, Maas, M L, Westhoff, R

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Flame-Retardant Rigid Polyurethane Foam from Allyl Glucosides von Otey, F.H., Westhoff, R.P., Mehltretter, C.L.

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Computing the infinitesimal invariants associated to deformations of subvarieties von Westhoff, Randall F.

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Cryogenic field effect transistors using strained silicon quantum wells in Si:SiGe heterostructures grown by APCVD von Rack, M.J, Thornton, T.J, Ferry, D.K, Roberts, Jeff, Westhoff, Richard C, Robinson, McDonald

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