Amorphous ice: stepwise formation of very-high-density amorphous ice from low-density amorphous ice at 125 K von Loerting, Thomas, Schustereder, Werner, Winkel, Katrin, Salzmann, Christoph G, Kohl, Ingrid, Mayer, Erwin

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(Invited) Challenges for Ion Implantation in Power Device Processing von Schustereder, Werner

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Aluminum Activation in 4H-SiC Measured on Laterally Contacted MOS Capacitors with a Buried Current-Spreading Layer von Rommel, Mathias, Pobegen, Gregor, Schustereder, Werner, Mletschnig, Kristijan Luka, Pichler, Peter

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An electrical and physical study of crystal damage in high-dose Al- and N-implanted 4H-SiC von Fisher, C. A., Esteve, R., Doering, S., Roesner, M., De Biasio, M., Kraft, M., Schustereder, W., Rupp, R.

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Alternative Highly Homogenous Drift Layer Doping for 650 V SiC Devices von Krippendorf, Florian, Schustereder, Werner, Akhmadaliev, Shavkat, Rupp, Roland, Csato, Constantin, Höchbauer, Tobias, Kern, Ronny, von Borany, Johannes, Rüb, Michael

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An EBIC and SRP study on thermal donors in proton implanted p-type magnetic Czochralski silicon von Faccinelli, Martin, Kirnstoetter, Stefan, Schustereder, Werner, Laven, Johannes G., Hadley, Peter

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Electrically detected magnetic resonance study on defects in Si pn-junctions created by proton implantation von Gruber, Gernot, Kirnstoetter, Stefan, Hadley, Peter, Koch, Markus, Aichinger, Thomas, Schulze, Holger, Schustereder, Werner

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(Invited) Challenges for Ion Implantation in Power Device Processing von Schustereder, Werner

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High Density Amorphous Ice from Cubic Ice von Loerting, Thomas, Kohl, Ingrid, Schustereder, Werner, Winkel, Katrin, Mayer, Erwin

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Deep-Level Defects in High-Dose Proton Implanted and High-Temperature Annealed Silicon von Jelinek, Moriz, Laven, Johannes, Rommel, Mathias, Schustereder, Werner, Schulze, Hans-Joachim, Frey, Lothar, Job, Reinhart

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Metastable Defects in Proton Implanted and Annealed Silicon von Job, Reinhart, Frey, Lothar, Laven, Johannes G., Ganagona, Naveen, Schustereder, Werner, Rommel, Mathias, Jelinek, Moriz, Schulze, Hans Joachim

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The Efficiency of Hydrogen-Doping as a Function of Implantation Temperature von Laven, Johannes G., Ganagona, Naveen, Schustereder, Werner, Rommel, Mathias, Jelinek, Moriz, Schulze, Hans Joachim, Frey, Lothar

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Defect engineering for modern power devices von Job, Reinhart, Laven, Johannes G., Niedernostheide, Franz-Josef, Schulze, Hans-Joachim, Schulze, Holger, Schustereder, Werner

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Depletion of superjunction power MOSFETs visualized by electron beam induced current and voltage contrast measurements von Kirnstoetter, Stefan, Faccinelli, Martin, Jelinek, Moriz, Schustereder, Werner, Laven, Johannes G., Schulze, Hans-Joachim, Hadley, Peter

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Radiation protection for high energy implantation of light ions in a production environment von Kroener, Friedrich, Schustereder, Werner, Fuchs, Dieter, Infineon Technologies AG, Regensburg, Wernerwerkstr. 2

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A New Method to Increase the Doping Efficiency of Proton Implantation in a High-Dose Regime von Jelinek, Moriz, Laven, Johannes, Job, Reinhart, Schustereder, Werner, Schulze, Hans-Joachim, Rommel, Mathias, Frey, Lothar

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High dose proton implantations into silicon: a combined EBIC, SRP and TEM study von Kirnstoetter, Stefan, Faccinelli, Martin, Gspan, Christian, Grogger, Werner, Jelinek, Moriz, Schustereder, Werner, Laven, Johannes G., Schulze, Hans-Joachim, Hadley, Peter

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Multiple Proton Implantations into Silicon: A Combined EBIC and SRP Study von Faccinelli, Martin, Hadley, Peter, Kirnstötter, Stefan, Laven, Johannes G., Schulze, Hans Joachim, Schustereder, Werner, Jelinek, Moriz

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Investigation of Doping Type Conversion and Diffusion Length Extraction of Proton Implanted Silicon by EBIC von Kirnstötter, Stefan, Faccinelli, Martin, Hadley, Peter, Job, Reinhart, Schustereder, Werner, Laven, Johannes G., Schulze, Hans-Joachim

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(Invited) The Thermal Budget of Hydrogen-Related Donor Profiles: Diffusion-Limited Activation and Thermal Dissociation von Laven, Johannes G., Job, Reinhart, Schulze, Hans-Joachim, Niedernostheide, Franz-Josef, Schustereder, Werner, Frey, Lothar

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