Transient assay system for the analysis of PR-1a gene promoter in tobacco BY-2 cells von Ono, S. (Yokohama National Univ. (Japan)), Tanaka, T, Watakabe, Y, Hiratsuka, K

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Characteristics of submicron patterns fabricated by gallium focused-ion-beam sputtering von MORIMOTO, H, SASAKI, Y, WATAKABE, Y, KATO, T

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Bioluminescence reporter assay system to monitor Arabidopsis MPK3 gene expression in response to infection by Botrytis cinerea von Tanaka, T.(Yokohama National Univ. (Japan)), Ono, S, Watakabe, Y, Hiratsuka, K

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Focused ion beam lithography and its application to submicron devices von Morimoto, H., Sasaki, Y., Saitoh, K., Watakabe, Y., Kato, T.

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High-performance VLSI photomask with a molybdenum silicide film von Shigetomi, A., Matsuda, S., Watakabe, Y., Kato, T.

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Mask fabrication by using an electron beam resist, chloromethylated polystyrene, and dry etching process von SAEKI, H, SHIGETOMI, A, WATAKABE, Y

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High sensitivity, dry-etch-resistant negative EB resist von SAEKI, H, SHIGETOMI, A, WATAKABE, Y, KATO, T

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Registration accuracy in focused-ion-beam lithography for the fabrication of a GaAs FET with a mushroom gate von YASUOKA, A, HOSONO, K, MORIMOTO, H, SASAKI, Y, WATAKABE, Y, KATO, T

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Elimination of substrate damage in focused-ion-beam repair of photomask von Onoda, H., Morimoto, H., Kawashima, M., Watakabe, Y., Kato, T.

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Expression of the AtRAD51 Gene Promoter in Response to DNA Damage in Transgenic Tobacco von MAEDA, Tomohide, WATAKABE, Yuriko, SEO, Seunghee, TAKASE, Hisabumi, HIRATSUKA, Kazuyuki

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Mark detection technology in electron-beam direct writing von Kashiwaki, T., Morimoto, H., Takeuchi, S., Saitoh, K., Watakabe, Y., Kato, T.

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A Dry Etching Technique Using Electron Beam Resist‐PBS von Yamazaki, T., Watakabe, Y., Suzuki, Y., Nakata, H.

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Stable performance Nb variable thickness microbridge type Josephson junctions: A reproducible fabrication technique von Kodama, Jun-ichi, Hontsu, Shigeki, Hirai, Heihachiro, Oka, Hisao, Kato, Tadao, Watakabe, Yaichiro, Kato, Taka-aki

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Fabrication of ECL gate arrays on quick turn-around line von Watakabe, Y., Tsukamoto, K., Harada, H., Saitoh, K., Kato, T.

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Chromium etching characteristics using a planar type plasma reactor von Saeki, H., Watakabe, Y., Toyoda, H., Nakata, H., Kashiwagi, T.

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Dynamic thermal response of photomasks caused by excimer laser pulse von CHIBA, A, WATAKABE, Y

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X-ray mask fabrication process using Cr mask and ITO stopper in the dry etching of W absorber von FUJINO, T, SASAKI, K, MARUMOTO, K, YABE, H, YOSHIOKA, N, WATAKABE, Y

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Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process von Hosono, Kunihiro, Nagamura, Yoshikazu, Kusunose, Haruhiko, Yoshioka, Nobuyuki, Yaichiro Watakabe, Yaichiro Watakabe, Yoichi Akasaka, Yoichi Akasaka

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Sputtered W-Ti Film for X-Ray Mask Absorber von Yabe, Hideki, Marumoto, Kenji, Aya, Sunao, Yoshioka, Nobuyuki, Fujino, Takeshi, Watakabe, Yaichiro, Yasuji Matsui, Yasuji Matsui

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Characterization of Agents That Induce Acquired Resistance by Transgenic Plants von WATAKABE, Yuriko, ONO, Sachiko, HIRATSUKA, Kazuyuki

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