Investigation on Sige Selective Epitaxy for Source and Drain Engineering in 22 Nm CMOS Technology Node and Beyond von Wang, Guilei

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Si and SiGe Nanowire for Micro-Thermoelectric Generator: A Review of the Current State of the Art von Li, You, Wang, Guilei, Akbari-Saatlu, Mehdi, Procek, Marcin, Radamson, Henry H.

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Review of Highly Mismatched III-V Heteroepitaxy Growth on (001) Silicon von Du, Yong, Xu, Buqing, Wang, Guilei, Miao, Yuanhao, Li, Ben, Kong, Zhenzhen, Dong, Yan, Wang, Wenwu, Radamson, Henry H

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Effective electrical manipulation of a topological antiferromagnet by orbital torques von Zheng, Zhenyi, Zeng, Tao, Zhao, Tieyang, Shi, Shu, Ren, Lizhu, Zhang, Tongtong, Jia, Lanxin, Gu, Youdi, Xiao, Rui, Zhou, Hengan, Zhang, Qihan, Lu, Jiaqi, Wang, Guilei, Zhao, Chao, Li, Huihui, Tay, Beng Kang, Chen, Jingsheng

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State of the Art and Future Perspectives in Advanced CMOS Technology von Radamson, Henry H., Zhu, Huilong, Wu, Zhenhua, He, Xiaobin, Lin, Hongxiao, Liu, Jinbiao, Xiang, Jinjuan, Kong, Zhenzhen, Xiong, Wenjuan, Li, Junjie, Cui, Hushan, Gao, Jianfeng, Yang, Hong, Du, Yong, Xu, Buqing, Li, Ben, Zhao, Xuewei, Yu, Jiahan, Dong, Yan, Wang, Guilei

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Low Temperature (Down to 6 K) and Quantum Transport Characteristics of Stacked Nanosheet Transistors with a High-K/Metal Gate-Last Process von Zhu, Xiaohui, Cao, Lei, Wang, Guilei, Yin, Huaxiang

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Stressor SiNx contact etch stop layer (CESL) technology and its application in nano-scale transistors von Xu, Qiang, Xiong, Wenjuan, Wang, Guilei, Ye, Tianchun

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Novel gap filling technique of shallow trench isolation structure in 16/14 nm FinFET using sub-atmospheric chemical vapor deposition von Xu, Qiang, Wang, Guilei, Xiong, Wenjuan, Ye, Tianchun

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Growth of high-quality epitaxy of GaAs on Si with engineered Ge buffer using MOCVD von Du, Yong, Xu, Buqing, Wang, Guilei, Gu, Shihai, Li, Ben, Kong, Zhenzhen, Yu, Jiahan, Bai, Guobin, Li, Junjie, Wang, Wenwu, Radamson, Henry H.

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Miniaturization of CMOS von Radamson, Henry H, He, Xiaobin, Zhang, Qingzhu, Liu, Jinbiao, Cui, Hushan, Xiang, Jinjuan, Kong, Zhenzhen, Xiong, Wenjuan, Li, Junjie, Gao, Jianfeng, Yang, Hong, Gu, Shihai, Zhao, Xuewei, Du, Yong, Yu, Jiahan, Wang, Guilei

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Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors Application von Li, Chen, Lin, Hongxiao, Li, Junjie, Yin, Xiaogen, Zhang, Yongkui, Kong, Zhenzhen, Wang, Guilei, Zhu, Huilong, Radamson, Henry H.

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Review of Si-Based GeSn CVD Growth and Optoelectronic Applications von Miao, Yuanhao, Wang, Guilei, Kong, Zhenzhen, Xu, Buqing, Zhao, Xuewei, Luo, Xue, Lin, Hongxiao, Dong, Yan, Lu, Bin, Dong, Linpeng, Zhou, Jiuren, Liu, Jinbiao, Radamson, Henry H.

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Special Issue: Silicon Nanodevices von Radamson, Henry H., Wang, Guilei

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Design impact on the performance of Ge PIN photodetectors von Zhao, Xuewei, Moeen, M., Toprak, M. S., Wang, Guilei, Luo, Jun, Ke, Xingxing, Li, Zhihua, Liu, Daoqun, Wang, Wenwu, Zhao, Chao, Radamson, Henry H.

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The Impact of Ambient Temperature on Electrothermal Characteristics in Stacked Nanosheet Transistors with Multiple Lateral Stacks von Zhao, Peng, Cao, Lei, Wang, Guilei, Wu, Zhenhua, Yin, Huaxiang

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SiN-based platform toward monolithic integration in photonics and electronics von Xiong, Wenjuan, Wang, Guilei, Li, Junfeng, Zhao, Chao, Wang, Wenwu, Radamson, Henry H.

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Study of n-type doping in germanium by temperature based PF+ implantation von Liu, Jinbiao, Wang, Guilei, Li, Junfeng, Kong, Zhenzhen, Radamson, Henry H.

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Impact of Ge Preamorphization Implantation on Both the Formation of Ultrathin TiSix and the Specific Contact Resistivity in TiSix/n-Si Contacts von Mao, Shujuan, Wang, Guilei, Xu, Jing, Luo, Xue, Zhang, Dan, Duan, Ningyuan, Liu, Shi, Wang, Wenwu, Chen, Dapeng, Li, Junfeng, Zhao, Chao, Ye, Tianchun, Luo, Jun

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Study of selective isotropic etching Si1−xGex in process of nanowire transistors von Li, Junjie, Wang, Wenwu, Li, Yongliang, Zhou, Na, Wang, Guilei, Kong, Zhenzhen, Fu, Jianyu, Yin, Xiaogen, Li, Chen, Wang, Xiaolei, Yang, Hong, Ma, Xueli, Han, Jianghao, Zhang, Jing, Wei, Yijun, Hu, Tairan, Yang, Tao, Li, Junfeng, Yin, Huaxiang, Zhu, Huilong, Radamson, Henry H.

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Vertical Surrounding Gate Transistor for High Density and Low Voltage Operation in DRAM von Wang, Wenqi, Yi, Sang Don, Li, Fu, Cao, Qingchen, Shi, Jiangliu, Kang, Bok Moon, Jin, Meichen, Liu, Chang, Wu, Zhenhua, Wang, Guilei, Zhao, Chao

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