Mechanistic Studies on the Aryl−Aryl Interchange Reaction of ArPdL2I (L = Triarylphosphine) Complexes von Goodson, Felix E, Wallow, Thomas I, Novak, Bruce M

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Performance impact of dynamic surface coatings on polymeric insulator-based dielectrophoretic particle separators von Davalos, Rafael V, McGraw, Gregory J, Wallow, Thomas I, Morales, Alfredo M, Krafcik, Karen L, Fintschenko, Yolanda, Cummings, Eric B, Simmons, Blake A

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Low-distortion, high-strength bonding of thermoplastic microfluidic devices employing case-II diffusion-mediated permeant activation von Wallow, Thomas I, Morales, Alfredo M, Simmons, Blake A, Hunter, Marion C, Krafcik, Karen Lee, Domeier, Linda A, Sickafoose, Shane M, Patel, Kamlesh D, Gardea, Andy

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Highly Efficient and Accelerated Suzuki Aryl Couplings Mediated by Phosphine-Free Palladium Sources von Wallow, Thomas I, Novak, Bruce M

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Application of “Transfer-Free” Suzuki Coupling Protocols toward the Synthesis of “Unambiguously Linear” Poly(p-phenylenes) von Goodson, Felix E, Wallow, Thomas I, Novak, Bruce M

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In aqua synthesis of water-soluble poly(p-phenylene) derivatives von Wallow, Thomas I, Novak, Bruce M

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A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure von Yamaguchi, Masanori, Wallow, Thomas, Yamada, Yohei, Kim, Ryoung-Han, Kye, Jongwook, Levinson, Harry J.

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Pathway to sub-30nm Resolution in EUV Lithography von Thakerlay, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Montgomery, Warren, Petrillo, Karen, Wood, Robert, Koay, Chief-seng, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.

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New Methods for the Synthesis of ArPdL2I (L = Tertiary Phosphine) Complexes von Wallow, Thomas I, Goodson, Felix E, Novak, Bruce M

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Process optimization of templated DSA flows von Gronheid, Roel, Bekaert, Joost, Kuppuswamy, Vijaya-Kumar Murugesan, Vandenbroeck, Nadia, Doise, Jan, Cao, Yi, Lin, Guanyang, Sayan, Safak, Parnell, Doni, Somervell, Mark

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Method for scanning a sample by a charged particle beam system von Lyons, Adam, Wallow, Thomas I

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METHOD FOR SCANNING A SAMPLE BY A CHARGED PARTICLE BEAM SYSTEM von WALLOW, Thomas I, LYONS, Adam

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The Influence of Photoacid Structure on the Design and Performance of 193-nm Resists von Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, Sooriyakumaran, Ratnam, Hofer, Donald C.

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Platform-Dependent Properties of 193nm Single Layer Resists von Allen, Robert D., Wallow, Thomas I., Opitz, Juliann, Larson, Carl, DiPietro, Richard A., Sooriyakumaran, Ratnam, Brock, Philip, Breyta, Greg, Hofer, Donald C., Jayaraman, Saikumar, Vicari, Richard, Hullihen, Karen A., Rhodes, Larry F., Goodall, Brian L., Shick, Robert A.

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A CHARGED PARTICLE BEAM SYSTEM FOR SCANNING A SAMPLE von WALLOW, Thomas I, LYONS, Adam

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OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RESOLUTION FEATURES TO ENHANCE MEASUREMENT von WALLOW, Thomas I, SOCHA, Robert John

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Method for scanning a sample by a charged particle beam system von Lyons, Adam, Wallow, Thomas I

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A CHARGED PARTICLE BEAM SYSTEM FOR SCANNING A SAMPLE von WALLOW, Thomas I, LYONS, Adam

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METHOD FOR SCANNING A SAMPLE BY A CHARGED PARTICLE BEAM SYSTEM von WALLOW, Thomas I, LYONS, Adam

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OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RESOLUTION FEATURES TO ENHANCE MEASUREMENT von SOCHA, Robert, WALLOW, Thomas

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