Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials von Sun, Guorong, Cho, Sangho, Clark, Corrie, Verkhoturov, Stanislav V, Eller, Michael J, Li, Ang, Pavía-Jiménez, Adriana, Schweikert, Emile A, Thackeray, James W, Trefonas, Peter, Wooley, Karen L

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Understanding of Strategic Design of Resist Formulation Through Studying of Quencher-Functional Component and Those Contributions to High Resolution Patterning von Lee, Choong-Bong, Park, James, Cutler, Charlotte, DeSisto, Jason, Rena, Rochelle, Marangoni, Tomas, Aqad, Emad, Thackeray, James W.

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Roughness Power Spectral Density as a Function of Aerial Image and Basic Process / Resist Parameters von Cutler, Charlotte, Lee, Choong-Bong, Thackeray, James W., Trefonas, Peter, Nelson, John, DeSisto, Jason, Li, Mingqi, Rena, Rochelle, Mack, Chris

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Utilizing Roughness Power Spectral Density Variables to Guide Resist Formulation and Understand Impact of Frequency Analysis through Process von Cutler, Charlotte, Lee, Choong-Bong, Thackeray, James W., Mack, Chris, Nelson, John, DeSisto, Jason, Li, Mingqi, Aqad, Emad, Hou, Xisen, Marangoni, Tomas, Kaitz, Joshua, Rena, Rochelle

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Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance von Ober, Matthias S, Romer, Duane R, Etienne, John, Thomas, P. J, Jain, Vipul, Cameron, James F, Thackeray, James W

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Generation of Powerful Tungsten Reductants by Visible Light Excitation von Sattler, Wesley, Ener, Maraia E, Blakemore, James D, Rachford, Aaron A, LaBeaume, Paul J, Thackeray, James W, Cameron, James F, Winkler, Jay R, Gray, Harry B

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Understanding the Role of Acid vs. Electron Blur in EUV Resist Materials von Thackeray, James W., Wagner, Mike, Kang, Su Jun, Biafore, John

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Optimization of Polymer-bound PAG (PBP) for 20nm EUV Lithography von Thackeray, James W., Jain, Vipul Jain, Coley, Suzanne, Christianson, Matthew, Arriola, Daniel, LaBeaume, Paul, Kang, Su-Jin, Wagner, Mike, Sung, Jin Wuk, Cameron, Jim

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Advances in Low Diffusion EUV Resists von Thackeray, James W., Cameron, James F., Wagner, Michael, Coley, Suzanne, Labeaume, Vipu Paul, Ongayi, Owndi, Montgomery, Warren, Lovell, Dave, Biafore, John, Chakrapane, Vidhya, Ko, Akiteru

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Driving Force Dependence of Electron Transfer from Electronically Excited [Ir(COD)(μ-Me2pz)]2 to Photo-Acid Generators von Sattler, Wesley, Rachford, Aaron A, LaBeaume, Paul J, Coley, Suzanne M, Thackeray, James W, Cameron, James F, Müller, Astrid M, Winkler, Jay R, Gray, Harry B

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Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope von Cho, Sangho, Yang, Fan, Sun, Guorong, Eller, Michael J., Clark, Corrie, Schweikert, Emile A., Thackeray, James W., Trefonas, Peter, Wooley, Karen L.

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Design Considerations for EUV Resist Materials von Thackeray, James W., Aqad, Emad, Kang, Su Jin, Spear-Alfonso, Kathleen

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Design of Faster High Resolution Resists: Getting More Acid Yield from EUV Photons von Thackeray, James W., Aqad, Emad, Cronin, Michael F., Spear-Alfonso, Kathaleen

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Evaluation of High and Low Activation Resists for EUV Lithography von Thackeray, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Wallow, Tom, LaFontaine, Bruno

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Nanodomain analysis with cluster-SIMS: application to the characterization of macromolecular brush architecture von Yang, Fan, Cho, Sangho, Sun, Guorong, Verkhoturov, Stanislav V., Thackeray, James W., Trefonas, Peter, Wooley, Karen L., Schweikert, Emile A.

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Control of Presentation of Functional Ultraviolet Absorbers to the Surface of Photoresist Polymers Using Low Surface Energy Polymers von Du, Ke, Siauw, Meiliana, Valade, David, Jasieniak, Marek, Voelcker, Nicolas H., Trefonas, Peter, Thackeray, James W., Peng, Hui, Blakey, Idriss, Whittaker, Andrew K.

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Pathway to sub-30nm Resolution in EUV Lithography von Thakerlay, James W., Nassar, Roger A., Spear-Alfonso, Kathleen, Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Montgomery, Warren, Petrillo, Karen, Wood, Robert, Koay, Chief-seng, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.

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Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer-based positive-tone photoresist materials von Sun, Guorong, Cho, Sangho, Yang, Fan, He, Xun, Pavía-Sanders, Adriana, Clark, Corrie, Raymond, Jeffery E., Verkhoturov, Stanislav V., Schweikert, Emile A., Thackeray, James W., Trefonas, Peter, Wooley, Karen L.

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The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography von Thackeray, James W., Adams, Timothy, Cronin, Michael F., Denison, Mark, Fedynyshyn, Theodore H., Georger, Jacque, Mori, J. Michael, Orsula, George W., Sinta, Roger

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Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope: Precisely Control... von SANGHO CHO, FAN YANG, GUORONG SUN, ELLER, Michael J, CLARK, Corrie, SCHWEIKERT, Emile A, THACKERAY, James W, TREFONAS, Peter, WOOLEY, Karen L

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