Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect von Stuerzebecher, Lorenz, Harzendorf, Torsten, Vogler, Uwe, Zeitner, Uwe D, Voelkel, Reinhard

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Coherent Ray Tracing Simulation Of Non-Imaging Laser Beam Shaping With Multi-Aperture Elements von Kirner, Raoul, Noell, Wilfried, Scharf, Toralf, Voelkel, Reinhard

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Fabrication and characterization of linear diffusers based on concave micro lens arrays von Bitterli, Roland, Scharf, Toralf, Herzig, Hans-Peter, Noell, Wilfried, de Rooij, Nico, Bich, Andreas, Roth, Sylvain, Weible, Kenneth J, Voelkel, Reinhard, Zimmermann, Maik, Schmidt, Michael

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Two step process for the fabrication of diffraction limited concave microlens arrays von Ruffieux, Patrick, Scharf, Toralf, Philipoussis, Irène, Herzig, Hans Peter, Voelkel, Reinhard, Weible, Kenneth J

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Micro‐Optics for Photolithography von Voelkel, Reinhard

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Micro‐Optics for Photolithography: Key enabling technology for wafer‐based manufacturing technology von Voelkel, Reinhard

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Improvements on the uniformity of large-area microlens arrays in Fused Silica von Kirner, Raoul, Béguelin, Jeremy, Eisner, Martin, Noell, Wilfried, Scharf, Toralf, Voelkel, Reinhard

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Optical characterization of high numerical aperture microlenses for quality assessment and fabrication process optimization von Beguelin, Jeremy, Symeonidis, Michael, Noell, Wilfried, Voelkel, Reinhard, Scharf, Toralf

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Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography von Vetter, Andreas, Yan, Chen, Kirner, Raoul, Scharf, Toralf, Noell, Wilfried, Voelkel, Reinhard, Rockstuhl, Carsten

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Refraction limit of miniaturized optical systems: a ball-lens example von Kim, Myun-Sik, Scharf, Toralf, Mühlig, Stefan, Fruhnert, Martin, Rockstuhl, Carsten, Bitterli, Roland, Noell, Wilfried, Voelkel, Reinhard, Herzig, Hans Peter

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Commented review on refractive microlenses and microlens arrays metrology von Béguelin, Jeremy, Voelkel, Reinhard, Scharf, Toralf

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Measuring the modulus of the spatial coherence function using an error tolerant phase shifting algorithm and a continuous lateral shearing interferometer von Harder, Irina, Eisner, Martin, Völkel, Reinhard, Rothau, Sergej, Schwider, Johannes, Schwider, Peter

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Advanced mask aligner lithography: new illumination system von Voelkel, Reinhard, Vogler, Uwe, Bich, Andreas, Pernet, Pascal, Weible, Kenneth J, Hornung, Michael, Zoberbier, Ralph, Cullmann, Elmar, Stuerzebecher, Lorenz, Harzendorf, Torsten, Zeitner, Uwe D

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Unified rule based correction for corners in proximity lithography mask using high resolution features von Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Herzig, Hans Peter, Vogler, Uwe, Voelkel, Reinhard

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On the chromatic aberration of microlenses von Ruffieux, Patrick, Scharf, Toralf, Herzig, Hans Peter, Völkel, Reinhard, Weible, Kenneth J

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Customized illumination for process window optimization and yield improvement in mask aligner lithography systems von Hornung, Michael, Vogler, Uwe, Voelkel, Reinhard

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Micro-Optics: From High-End to Mass-Market von Voelkel, Reinhard

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Flexible beam shaping system using fly's eye condenser von Lindlein, Norbert, Bich, Andreas, Eisner, Martin, Harder, Irina, Lano, Maik, Voelkel, Reinhard, Weible, Ken, Zimmermann, Maik

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Device for optical imaging von WIPPERMANN FRANK, DUPARRE JACQUES, BRAEUER ANDREAS, VOELKEL REINHARD, BRUECKNER ANDREAS, LEITEL ROBERT

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Illumination system for a microlithographic projection exposure apparatus von Siekmann Heiko, Scharnweber Ralf, Layh Michael, Wangler Johannes, Scholz Axel, Spengler Uwe, Deguenther Markus, Maul Manfred, Voelkel Reinhard, Weible Kenneth

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