Scanning electron microscope measurement of width and shape of 10nm patterned lines using a JMONSEL-modeled library von Villarrubia, J.S., Vladár, A.E., Ming, B., Kline, R.J., Sunday, D.F., Chawla, J.S., List, S.

Volltext

Scanning electron microscope dimensional metrology using a model-based library von Villarrubia, J. S., Vladár, A. E., Postek, M. T.

Volltext

Metrology for the next generation of semiconductor devices von Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

Volltext

Research Update: Electron beam-based metrology after CMOS von Liddle, J. A., Hoskins, B. D., Vladár, A. E., Villarrubia, J. S.

Volltext

Electron beam-based metrology after CMOS von Liddle, J A, Hoskins, B D, Vladár, A E, Villarrubia, J S

Volltext

Simulated SEM images for resolution measurement von Cizmar, P., Vladár, A. E., Ming, B., Postek, M. T.

Volltext

Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library von Villarrubia, J.S., Vladár, A.E., Ming, B., Kline, R.J., Sunday, D.F., Chawla, J.S., List, S.

Volltext

Modeling the Point-Spread Function in Helium-Ion Lithography von Winston, Donald, Ferrera, J., Battistella, L., Vladár, A. E., Berggren, K. K.

Volltext

Focused Helium Ion Beam Nanomachining of Thin Membranes vs. Bulk Substrates von Mutunga, E.M., Lockerman, S., Tan, S., Livengood, R., Vladár, A.E., Klein, K.L.

Volltext

Sample preparation protocols for realization of reproducible characterization of single-wall carbon nanotubes von Decker, J E, Hight Walker, A R, Bosnick, K, Clifford, C A, Dai, L, Fagan, J, Hooker, S, Jakubek, Z J, Kingston, C, Makar, J, Mansfield, E, Postek, M T, Simard, B, Sturgeon, R, Wise, S, Vladar, A E, Yang, L, Zeisler, R

Volltext

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part 1- applications to accurate dimension measurements von Postek, Michael T., Vladár, András E., Wells, Oliver C., Lowney, Jerry L.

Volltext

Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching von Chien, F. S.-S., Hsieh, W.-F., Gwo, S., Vladar, A. E., Dagata, J. A.

Volltext

Widening the Window of Particle Beam Technology: Helium Ion Microscopy von Postek, M., Vladar, A.E., Ming, B., Purushotham, K.

Volltext

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part II- chemically-mechanically planarized samples von Wells, Oliver C., McGlashan-Powell, Maurice, Vladár, András E., Postek, Michael T.

Volltext

Image sharpness measurement in the scanning electron microscope-Part III von Zhang, Nien Fan, Postek, Michael T., Larrabee, Robert D., Vladár, András E., Keery, William J., Jones, Samuel N.

Volltext

Progression of Focused Helium Ion Beam Milling in Gold Substrates von Mutunga, E.M., Tan, S., Vladar, A.E., Klein, K.L.

Volltext

Publisher Correction: Metrology for the next generation of semiconductor devices von Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

Volltext

Helium Ion Nanomachining in Membranes and Bulk Substrates von Mutunga, E.M., Vladar, A.E., Stern, L.A., Klein, K.L.

Volltext

A Study of Helium Ion Beam Substrate Interaction Volume on Nanomachining Profiles in Bulk Substrates and Thin Film Membranes von Livengood, R., Tan, S., Greenzweig, Y., Hallstein, R., Shima, D., Klein, K., Vladar, A.E.

Volltext

Understanding Surface Modification of Silicon-based Materials using Gas Field Ion Source FIB for Nano-Machining Applications von Klein, K.L., Huynh, C., Stern, L., Vladar, A., Melngailis, J., Cai, X.

Volltext