Tracer study of pore initiation in anodic alumina formed in phosphoric acid von Baron-Wiecheć, A., Burke, M.G., Hashimoto, T., Liu, H., Skeldon, P., Thompson, G.E., Habazaki, H., Ganem, J.-J., Vickridge, I.C.

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Limiting step involved in the thermal growth of silicon oxide films on silicon carbide von Vickridge, I C, Trimaille, I, Ganem, J-J, Rigo, S, Radtke, C, Baumvol, I J R, Stedile, F C

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Porous Anodic Alumina Growth in Borax Electrolyte von Baron-Wiecheć, A., Skeldon, P., Ganem, J. J., Vickridge, I. C., Thompson, G. E.

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Direct measurement of molecular breakup dynamics and vicinage effect of swift proton clusters using narrow nuclear resonance profiling von L’Hoir, A., Ganem, J.J., Trimaille, I., Vickridge, I.C.

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Oxygen isotopic exchange occurring during dry thermal oxidation of 6H SiC von Vickridge, I.C., Tromson, D., Trimaille, I., Ganem, J.-J., Szilágyi, E., Battistig, G.

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Polarity dependent carbon enrichment on 6H–SiC{ [formula omitted]} due to low energy ion bombardment von Battistig, G, Lábár, J.L, Gurbán, S, Sulyok, A, Menyhard, M, Vickridge, I.C, Szilagyi, E, Malherbe, J, Odendaal, Q

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Film growth and alloy enrichment during anodizing AZ31 magnesium alloy in fluoride/glycerol electrolytes of a range of water contents von Němcová, A., Galal, O., Skeldon, P., Kuběna, I., Šmíd, M., Briand, E., Vickridge, I., Ganem, J-J., Habazaki, H.

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Study of thin hafnium oxides deposited by atomic layer deposition von Ganem, J.-J., Trimaille, I., Vickridge, I.C., Blin, D., Martin, F.

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High dose He implantation in two Ti alloys: Effects on structure and thermal oxidation von Vickridge, I.C., Johnson, P.B., Gilberd, P.W., Morrison, Y.

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TEM and IBA study of the thermal oxidation of V following high dose He implantation von Gilberd, P.W, Johnson, P.B, Vickridge, I.C, Wismayer, A.C

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[sup 18]O Tracer Study of Porous Film Growth on Aluminum in Phosphoric Acid von Baron-Wiecheć, A., Ganem, J. J., Garcia-Vergara, S. J., Skeldon, P., Thompson, G. E., Vickridge, I. C.

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The contribution of stable isotopic tracing, narrow nuclear resonance depth profiling, and a simple stochastic theory of charged particle energy loss to studies of the dry thermal... von Vickridge, I.C., Ganem, J.J., Trimaille, I., Cantin, J.-L.

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Depth resolution and narrow nuclear resonance profiling von Vickridge, I.C.

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Vicinage effect for hydrogen clusters in Si3N4 and SiO2 von L'Hoir, A., Cohen, C., Ganem, J. J., Trimaille, Isabelle, Vickridge, I. C., Shubeita, S. M.

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Oxygen isotopic tracing study of the dry thermal oxidation of 6H SiC von Vickridge, I.C., Ganem, J.-J., Battistig, G., Szilagyi, E.

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Lithium and boron distributions in geological samples von Trompetter, W.J., Reyes, A.G., Vickridge, I.C., Markwitz, A.

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Modification of the Oxide/Semiconductor Interface by High Temperature NO Treatments: A Combined EPR, NRA and XPS Study on Oxidized Porous and Bulk n-Type 4H-SiC von Cantin, J.L., von Bardeleben, Hans Jürgen, Feldman, Leonard C., Song, Yong Wei, Williams, John R., Dhar, S., Shishkin, Y., Vickridge, I., Devaty, Robert P., Choyke, Wolfgang J., Ke, L.

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Formation of modified Si/SiO2 interfaces with intrinsic low defect concentrations von Gosset, L. G., Ganem, J. J., von Bardeleben, H. J., Rigo, S., Trimaille, I., Cantin, J. L., Åkermark, T., Vickridge, I. C.

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Narrow resonance profiling study of the oxidation of reactively sputtered Ti1−xAlxN thin films von Hugon, M.C, Desvignes, J.M, Agius, B, Vickridge, I.C, Kim, D.J, Kingon, A.I

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Electronic energy loss at zero atomic impact parameter: its importance for the Lewis effect and narrow nuclear resonance depth profiling von Vickridge, I.C., Amsel, G.

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