Chemical dry etching of GaAs(100) by HC1: products, rate, and a kinetic model von Su, Chaochin, Dai, Zi-Guo, Luo, Weiang, Sun, Dong-Hong, Vernon, Matthew F., Bent, Brian E.

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Infrared vibrational predissociation spectra of large water clusters von Page, Ralph H., Vernon, Matthew F., Shen, Y.R., Lee, Y.T.

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Low-temperature plasma etching of GaAs, AlGaAs, and AlAs von GREGUS, J. A, VERNON, M. F, GOTTSCHO, R. A, SCHELLER, G. R, HOBSON, W. S, OPILA, R. L, YOON, E

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Vibrational predissociation spectra and dynamics of small molecular clusters of H2O and HF von Vernon, Matthew F., Lisy, James M., Krajnovich, Douglas J., Tramer, Andrzej, Kwok, Hoi-Sing, Shen, Y. Ron, Lee, Yuan T.

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Holder for carrying a photolithography mask in a flattened condition von Vernon, Matthew F

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Holder for carrying a photolithography mask in a flattened condition von VERNON MATTHEW F

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Dry etching of GaAs with Cl2 : correlation between the surface Cl coverage and the etching rate at steady state von CHAOCHIN SU, MING XI, ZI-GUO DAI, VERNON, M. F, BENT, B. E

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Holder for carrying a photolithography mask in a flattened condition von VERNON MATTHEW F

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Correction for systematic, low spatial frequency critical dimension variations in lithography von VERNON MATTHEW F

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Correction for systematic, low spatial frequency critical dimension variations in lithography von MATTHEW F. VERNON

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CORRECTION FOR SYSTEMATIC, LOW SPATIAL FREQUENCY CRITICAL DIMENSION VARIATIONS IN LITHOGRAPHY von VERNON, MATTHEW, F

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Vibrational predissociation spectra of (HF) n , n = 2–6 von Lisy, James M., Tramer, Andrzej, Vernon, Matthew F., Lee, Yuan T.

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Dry etching of GaAs with Cl 2: correlation between the surface Cl coverage and the etching rate at steady state von Chaochin, Su, Ming, Xi, Zi-Guo, Dai, Vernon, Matthew F., Bent, Brian E.

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Dry etching of GaAs with Cl sub(2). Correlation between the surface Cl coverage and the etching rate at steady state von Su, Chaochin, Xi, Ming, Dai, Zi-Guo, Vernon, Matthew F, Bent, Brian E

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Dry etching of GaAs with Cl2: correlation between the surface Cl coverage and the etching rate at steady state von Su, Chaochin, Xi, Ming, Dai, Zi-Guo, Vernon, Matthew F., Bent, Brian E.

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Dry etching of GaAs with Cl 2: correlation between the surface Cl coverage and the etching rate at steady state von Su, Chaochin, Xi, Ming, Dai, Zi-Guo, Vernon, Matthew F., Bent, Brian E.

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Real-time, In Situ Monitoring Of Semiconductor Processing von Gottscho, R.A., Aydil, E.S., Giapis, K.P., Gregus, J.A., Euijoun Youn, Hayes, T.R., Vernon, M.F., Chakrabarti, U.K.

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Low Diagnostic Yield of Elective Coronary Angiography von Patel, Manesh R, Peterson, Eric D, Dai, David, Brennan, J. Matthew, Redberg, Rita F, Anderson, H. Vernon, Brindis, Ralph G, Douglas, Pamela S

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Quantum computational advantage with a programmable photonic processor von Madsen, Lars S., Laudenbach, Fabian, Askarani, Mohsen Falamarzi, Rortais, Fabien, Vincent, Trevor, Bulmer, Jacob F. F., Miatto, Filippo M., Neuhaus, Leonhard, Helt, Lukas G., Collins, Matthew J., Lita, Adriana E., Gerrits, Thomas, Nam, Sae Woo, Vaidya, Varun D., Menotti, Matteo, Dhand, Ish, Vernon, Zachary, Quesada, Nicolás, Lavoie, Jonathan

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Altered behavior, brain structure, and neurometabolites in a rat model of autism-specific maternal autoantibody exposure von Bruce, Matthew R., Couch, Amalie C. M., Grant, Simone, McLellan, Janna, Ku, Katherine, Chang, Christina, Bachman, Angelica, Matson, Matthew, Berman, Robert F., Maddock, Richard J., Rowland, Douglas, Kim, Eugene, Ponzini, Matthew D., Harvey, Danielle, Taylor, Sandra L., Vernon, Anthony C., Bauman, Melissa D., Van de Water, Judy

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