Damage tolerance of Ti3SiC2 to high energy iodine irradiation von Zhang, Lei, Qi, Q., Shi, L.Q., O’Connor, D.J., King, B.V., Kisi, E.H., Venkatachalam, D.K.

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Pharmacokinetics of a single intramuscular injection of cefquinome in buffalo calves von Venkatachalam, D., Dumka, V. K., Ranjan, B.

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Oxygen self-diffusion in HfO2 studied by electron spectroscopy von Vos, M, Grande, P L, Venkatachalam, D K, Nandi, S K, Elliman, R G

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A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices von Vos, M., Grande, P. L., Nandi, S. K., Venkatachalam, D. K., Elliman, R. G.

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Mutant prevention concentration, pharmacokinetic–pharmacodynamic integration, and modeling of enrofloxacin data established in diseased buffalo calves von Ramalingam, B., Sidhu, P. K., Kaur, G., Venkatachalam, D., Rampal, S.

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Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films von Nandi, S.K., Llewellyn, D. J., Belay, K., Venkatachalam, D.K., Liu, X., Elliman, R.G.

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Oxygen diffusion in TiO2 films studied by electron and ion Rutherford backscattering von Marmitt, G.G., Nandi, S.K., Venkatachalam, D.K., Elliman, R.G., Vos, M., Grande, P.L.

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Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films von Venkatachalam, D. K., Bradby, J. E., Saleh, M. N., Ruffell, S., Elliman, R. G.

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Edge irregular reflexive labeling of some tree graphs von Hesti Agustin, Ika, Utoyo, Imam, Daflk, Venkatachalam, M.

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The use of electron Rutherford backscattering to characterize novel electronic materials as illustrated by a case study of sputter-deposited NbOx films von Vos, M., Liu, X., Grande, P.L., Nandi, S.K., Venkatachalam, D.K., Elliman, R.G.

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Effect of crystallization on the reliability of unipolar resistive-switching in HfO2-based dielectrics von Saleh, M.N., Venkatachalam, D.K., Elliman, R.G.

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Oxygen Self-Diffusion in Studied by Electron Spectroscopy von Vos, M, Grande, P L, Venkatachalam, D K, Nandi, S K, Elliman, R G

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Oxygen Self-Diffusion in HfO 2 Studied by Electron Spectroscopy von Vos, M., Grande, P. L., Venkatachalam, D. K., Nandi, S. K., Elliman, R. G.

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The use of electron Rutherford backscattering to characterize novel electronic materials as illustrated by a case study of sputter-deposited NbO x films von Vos, M., Liu, X., Grande, P.L., Nandi, S.K., Venkatachalam, D.K., Elliman, R.G.

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Application of ion-implantation for improved non-volatile resistive random access memory (ReRAM) von Elliman, R.G., Saleh, M.S., Kim, T.-H., Venkatachalam, D.K., Belay, K., Ruffell, S., Kurunczi, P., England, J.

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Nanomechanical properties of sputter-deposited HfO 2 and Hf x Si 1-x O 2 thin films von Venkatachalam, D. K., Bradby, J. E., Saleh, M. N., Ruffell, S., Elliman, R. G.

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Determination of thickness and composition of high-k dielectrics using high-energy electrons von Grande, P. L., Vos, M., Venkatachalam, D. K., Nandi, S. K., Elliman, R. G.

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Mitochondrial DAMPs Are Released During Cardiopulmonary Bypass Surgery and Are Associated With Postoperative Atrial Fibrillation von Sander, Nicola, MBBS, Kaczmarek, Elzbieta, PhD, Itagaki, Kiyoshi, PhD, Zheng, Yi, PhD, Otterbein, Leo, PhD, Khabbaz, Kamal, MD, Liu, David, MD, Senthilnathan, Venkatachalam, MD, Gruen, Russell L., MBBS, PhD, Hauser, Carl J., MD, FACS, FCCM

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A Direct Comparison of Early and Late Outcomes With Three Approaches to Carotid Revascularization and Open Heart Surgery von Shishehbor, Mehdi H., DO, MPH, PhD, Venkatachalam, Sridhar, MD, Sun, Zhiyuan, MS, Rajeswaran, Jeevanantham, MSc, Kapadia, Samir R., MD, Bajzer, Christopher, MD, Gornik, Heather L., MD, Gray, Bruce H., DO, Bartholomew, John R., MD, Clair, Daniel G., MD, Sabik, Joseph F., MD, Blackstone, Eugene H., MD

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Changes in Tricuspid Annular Geometry in Patients with Functional Tricuspid Regurgitation von Hai, Ting, MD, Amador, Yannis, MD, Mahmood, Feroze, MD, Jeganathan, Jelliffe, MBBS, Khamooshian, Arash, MD, Knio, Ziyad O., BS, Matyal, Robina, MD, Nicoara, Alina, MD, Liu, David C., MD, Senthilnathan, Venkatachalam, MD, Khabbaz, Kamal R., MD

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