Investigation of borophosphosilicate glass roughness and planarization with the atomic force microscope technique von Tang, S.K, Vassiliev, V.Y, Mridha, S, Chan, L.H

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The electrical properties of chemical vapor deposited silicon oxide films for applications as interlayer dielectrics in ULSI von Loiko, K.V., Vassiliev, V.Y., Chee Tee Chua, Lim, D.H.Y.

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Trends in void-free pre-metal CVD dielectrics von Vassiliev, V.Y, Sudijono, J.L, Cuthbertson, A

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