Radiative melting of crystalline ruthenium oxide nanorods von Cross, M W, Varhue, W J

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Initial stages of growth of heteroepitaxial yttria-stabilized zirconia films on silicon substrates von BUNT, P, VARHUE, W. J, ADAMS, E, MONGEON, S

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Heteroepitaxial growth of yttria-stabilized zirconia on silicon (100) by reactive sputtering with an electron cyclotron resonance source von LILLE, J, VARHUE, W. J, MONGEON, S

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Silicon dioxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition von ANDOSCA, R. G, VARHUE, W. J, ADAMS, E

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Epitaxial film thickness in the low-temperature growth of Si(100) by plasma enhanced chemical vapor deposition von Varhue, W. J., Rogers, J. L., Andry, P. S., Adams, E.

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Low-temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition von Rogers, J. L., Andry, P. S., Varhue, W. J., McGaughnea, P., Adams, E., Kontra, R.

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Erbium-doped silicon films grown by plasma-enhanced chemical-vapor deposition von Rogers, J. L., Andry, P. S., Varhue, W. J., Adams, E., Lavoie, M., Klein, P. B.

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Very-Low-Frequency Electromagnetic Field Detector With Data Acquisition von Hanna, S.A., Motai, Y., Varhue, W.J., Titcomb, S.

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Raman scattering and the π-orbitals in amorphous carbon films von SINNA, K, MENENDEZ, J, SANKEY, O. F, JOHNSON, D. A, VARHUE, W. J, KIDDER, J. N, PASTEL, P. W, LANFORD, W

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Lamb-wave microdevices fabricated on monolithic single crystal silicon wafers von Fischer, D., Varhue, W.J., Wu, J., Whiting, C.A.

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Parameter space map of an electron cyclotron resonance plasma in a compact chamber von Lille, J.S., Mcgaughnea, P.E., Varhue, W.J.

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Electrical and chemical characterization of a-C:H prepared by rf glow discharge von VARHUE, W. J, PANDELISEV, K. A, SHINSEKI, B. S

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Growth of Er-doped silicon using metalorganics by plasma-enhanced chemical vapor deposition von Andry, P. S., Varhue, W. J., Ladipo, F., Ahmed, K., Adams, E., Lavoie, M., Klein, P. B., Hengehold, R., Hunter, J.

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SiO2 deposition as a byproduct of SF6 plasma in an electron cyclotron resonance reactor von WATTS, A. J, VARHUE, W. J, GIBSON, M. L

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Loading effect of quartz microwave window on SF6 plasma in an electron cyclotron resonance reactor von WATTS, A. J, VARHUE, W. J

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The effect of hydrogen dilution on the electrical properties of hydrogenated amorphous silicon von Varhue, W.J., Chao, H.

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Low temperature epitaxial growth of Ge using electron-cyclotron-resonance plasma-assisted chemical vapor deposition von Varhue, W. J., Carulli, J. M., Peterson, G. G., Miller, J. A.

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Electrical properties of pn junctions formed by plasma enhanced epitaxial growth von Reidy, Sean G., Varhue, Walter J., Adams, Ed, Lavoie, Mark

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Lamb-wave microdevices fabricated on monolithic single crystal silicon wafers von FISCHER, D, VARHUE, W. J, JUNRU WU, WHITING, C. A

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SiO sub 2 deposition as a byproduct of SF sub 6 plasma in an electron cyclotron resonance reactor von Watts, A J, Varhue, W J, Gibson, M L

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