Montmorillonite-supported nanoscale zero-valent iron for removal of arsenic from aqueous solution: Kinetics and mechanism von Bhowmick, Subhamoy, Chakraborty, Sudipta, Mondal, Priyanka, Van Renterghem, Wouter, Van den Berghe, Sven, Roman-Ross, Gabriela, Chatterjee, Debashis, Iglesias, Mònica

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Ru thin film grown on TaN by plasma enhanced atomic layer deposition von Xie, Qi, Jiang, Yu-Long, Musschoot, Jan, Deduytsche, Davy, Detavernier, Christophe, Van Meirhaeghe, Roland L., Van den Berghe, Sven, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

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Effective reduction of fixed charge densities in germanium based metal-oxide-semiconductor devices von Deng, Shaoren, Xie, Qi, Deduytsche, Davy, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Van den Berghe, Sven, Qu, Xinping, Detavernier, Christophe

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Ultrathin GeOxNy interlayer formed by in situ  NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices von Xie, Qi, Musschoot, Jan, Schaekers, Marc, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Jiang, Yu-Long, Van den Berghe, Sven, Liu, Junhu, Detavernier, Christophe

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Characterization of fresh EMPIrE and SEMPER FIDELIS U(Mo)/Al fuel plates made with PVD-coated U(Mo) particles von Iltis, Xavière, Palancher, Hervé, Allenou, Jérôme, Vanni, Florence, Stepnik, Bertrand, Leenaers, Ann, Van Den Berghe, Sven, Keiser, Dennis D., Glagolenko, Irina

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Status of the Low Enriched Uranium Fuel Development for High Performance Research Reactors von Leenaers, Ann, Sannen, Leo, van den Berghe, Sven

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Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma von QI XIE, MUSSCHOOT, Jan, DETAVERNIER, Christophe, DEDUYTSCHE, Davy, VAN MEIRHAEGHE, Roland L, VAN DEN BERGHE, Sven, JIANG, Yu-Long, RU, Guo-Ping, LI, Bing-Zong, QU, Xin-Ping

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A novel approach to determine the local burnup in irradiated fuels using Atom Probe Tomography (APT) von Bachhav, Mukesh, Gan, Jian, Keiser, Dennis, Giglio, Jeffrey, Jädernäs, Daniel, Leenaers, Ann, Van den Berghe, Sven

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Behavior of As(V) with ZVI–H2O System and the Reduction to As(0) von Mondal, Priyanka, Bhowmick, Subhamoy, Jullok, Nora, Ye, Wenyuan, Van Renterghem, Wouter, Van den Berghe, Sven, Van der Bruggen, Bart

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Microstructural characterization of a thin film ZrN diffusion barrier in an As-fabricated U–7Mo/Al matrix dispersion fuel plate von Keiser, Dennis D., Perez, Emmanuel, Wiencek, Tom, Leenaers, Ann, Van den Berghe, Sven

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Contributions to the mechanistic understanding of the microstructural evolution in irradiated U-Mo dispersion fuel von Salvato, Daniele, Smith, Charlyne A., Pavlov, Tsvetoslav R., Hanson, William Alexander, Bawane, Kaustubh Krishna, Bachhav, Mukesh N., Miller, Brandon D., Trowbridge, Tammy L., Gan, Jian, Giglio, Jeffrey J., Winston, Alexander J., Henley, Jody L., Robinson, Adam B., Keiser, Dennis D., Glagolenko, Irina Y., Ye, B., Mei, Z. -G., Jamison, Laura M., Hofman, Gerard L., Yacout, Abdellatif M., Van den Berghe, Sven, Leenaers, Ann

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Contributions to the mechanistic understanding of the microstructural evolution in irradiated U-Mo dispersion fuel von Salvato, Daniele, Smith, Charlyne A., Pavlov, Tsvetoslav R., Hanson, William A., Bawane, Kaustubh K., Bachhav, Mukesh N., Miller, Brandon D., Trowbridge, Tammy L., Gan, Jian, Giglio, Jeffrey J., Winston, Alexander J., Henley, Jody L., Robinson, Adam B., Keiser, Dennis D., Glagolenko, Irina Y., Ye, B., Mei, Z.-G., Jamison, Laura M., Hofman, Gerard L., Yacout, Abdellatif M., Van den Berghe, Sven, Leenaers, Ann

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Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition von Xie, Qi, Musschoot, Jan, Deduytsche, Davy, Van Meirhaeghe, Roland L., Detavernier, Christophe, Van den Berghe, Sven, Jiang, Yu-Long, Ru, Guo-Ping, Li, Bing-Zong, Qu, Xin-Ping

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Microstructural characterization of a thin film ZrN diffusion barrier in an As-fabricated U–7Mo/Al matrix dispersion fuel plate von Keiser, Jr., Dennis D., Perez, Emmanuel, Wiencek, Tom, Leenaers, Ann, Van den Berghe, Sven

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Feasibility studies for simultaneous irradiation of NBSR & MITR fuel elements in the BR2 reactor von Kalcheva, Silva, Van den Branden, Geert, Van Dyck, Steven, Van den Berghe, Sven, Housley, Greg K., Woolstenhulme, Nicolas E., Glagolenko, Irina, Cole, James I.

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Behavior of As(V) with ZVI–H 2 O System and the Reduction to As(0) von Mondal, Priyanka, Bhowmick, Subhamoy, Jullok, Nora, Ye, Wenyuan, Van Renterghem, Wouter, Van den Berghe, Sven, Van der Bruggen, Bart

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Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing von Deng, Shaoren, Verbruggen, Sammy W., Lenaerts, Silvia, Martens, Johan A., Van den Berghe, Sven, Devloo-Casier, Kilian, Devulder, Wouter, Dendooven, Jolien, Deduytsche, Davy, Detavernier, Christophe

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Electrical discharge machining of B4C–TiB2 composites von Malek, O, Vleugels, J, Vanmeensel, K, Huang, S, Liu, J, Van, den Berghe S, Datye, A, Wu, K-H, Lauwers, B

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TiO2/HfO2 Bi-Layer Gate Stacks Grown by Atomic Layer Deposition for Germanium-Based Metal-Oxide-Semiconductor Devices Using GeOxNy Passivation Layer von Xie, Qi, Musschoot, Jan, Schaekers, Marc, Caymax, Matty, Delabie, Annelies, Lin, Dennis, Qu, Xin-Ping, Jiang, Yu-Long, den Berghe, Sven Van, Detavernier, Christophe

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Key aspects of the UNICORE 6 security model von Benedyczak, Krzysztof, Bała, Piotr, van den Berghe, Sven, Menday, Roger, Schuller, Bernd

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