Progress in EUV Resist Performance von Goethals, A. M., Gronheid, R., Roey, F. Van, Solak, H. H., Ekinci, Y.

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Status of EUV Lithography at IMEC von Goethal, A. M., Jockheere, R., Lurusso, C. F., Hermans, J., Roey, F. Van, Myers, A., Niroomand, A., Kim, I., Iwamoto, F., Stepenenko, N., Ronse, K.

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EUV Resist Screening: Current Performance and Issues von Goethals, A. M., Gronheld, R., Leumissen, L. H. A., Roey, F. Van, Solak, H. H.

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300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition von Clerix, J.J., Warad, L., Hung, J., Hody, H., Van Roey, F., Lorusso, G., Koret, R., Lee, W.T., Shah, K., Delabie, A.

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300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition von Clerix, J.J, Warad, L, Hung, J, Hody, H, Van Roey, F, Lorusso, G, Koret, R, Lee, W.T, Shah, K, Delabie, A

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157nm resist process performance and integration challenges on a full field scanner von Goethals, A. M., Gronheid, R., Light, S., Ercken, M., Roey, F. Van, Heuvel, D. Van, Locorotondo, S., Rose, K.

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Introducing 157 nm Full Field Lithography von Goethals, A.M., Bisschop, P. De, Hermans, J., Jonckheere, R., Roey, F. Van, Heuvel, D. Van den, Eliat, A., Ronse, K.

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Implementation of ArF Resist Processes for 130nm and below von Goethals, A.M., Roey, F. van, Vandenberghe, G., Jaenen, P., Pollers, I., Pollentier, I., Ronse, K.

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Recent advancements in 193 nm step and scan lithography von Goethals, A.M., Jaenen, P., Pollers, I., Roey, F. van, Ronse, K., Heskamp, B., Davies, G.

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Characterization of extreme ultraviolet resists with interference lithography von Gronheid, Roel, Solak, Harun H., Ekinci, Yasin, Jouve, Amandine, Van Roey, Frieda

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Lithographic performance of 193nm single and bi-layer materials von Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.

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Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology von Sugihara, T., Van Roey, F., Goethals, A.M., Ronse, K., Van den hove, L.

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Recent advancements in 193nm step and scan lithography von Goethals, A.M., Jaenen, P., Pollers, I., Roey, F. van, Ronse, K., Heskamp, B., Davies, G.

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Lithographic performance of 193 nm single and bi-layer materials von Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.

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EUV Resist Screening von M. Goethals, A, Gronheld, R, H. A. Leumissen, L, Van Roey, F, H. Solak, H

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Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology von Veloso, A., Demuynck, S., Ercken, M., Goethals, A.M., Locorotondo, S., Lazzarino, F., Altamirano, E., Huffman, C., De Keersgieter, A., Brus, S., Demand, M., Struyf, H., De Backer, J., Hermans, J., Delvaux, C., Baudemprez, B., Vandeweyer, T., Van Roey, F., Baerts, C., Goossens, D., Dekkers, H., Ong, P., Heylen, N., Kellens, K., Volders, H., Hikavyy, A., Vrancken, C., Rakowski, M., Verhaegen, S., Dusa, M., Romijn, L., Pigneret, C., Van Dijk, A., Schreutelkamp, R., Cockburn, A., Gravey, V., Meiling, H., Hultermans, B., Lok, S., Shah, K., Rajagopalan, R., Gelatos, J., Richard, O., Bender, H., Vandenberghe, G., Beyer, G.P., Absil, P., Hoffmann, T., Ronse, K., Biesemans, S.

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Full-field EUV and immersion lithography integration in 0.186μm2 FinFET 6T-SRAM cell von Veloso, A., Demuynck, S., Ercken, M., Goethals, A.M., Demand, M., de Marneffe, J.-F., Altamirano, E., De Keersgieter, A., Delvaux, C., De Backer, J., Brus, S., Hermans, J., Baudemprez, B., Van Roey, F., Lorusso, G.F., Baerts, C., Goossens, D., Vrancken, C., Mertens, S., Versluijs, J.J., Truffert, V., Huffman, C., Laidler, D., Heylen, N., Ong, P., Parvais, B., Rakowski, M., Verhaegen, S., Hikavyy, A., Meiling, H., Hultermans, B., Romijn, L., Pigneret, C., Lok, S., Van Dijk, A., Shah, K., Noori, A., Gelatos, J., Arghavani, R., Schreutelkamp, R., Boelen, P., Richard, O., Bender, H., Witters, L., Collaert, N., Rooyackers, R., Absil, P., Lauwers, A., Jurczak, M., Hoffmann, T., Vanhaelemeersch, S., Cartuyvels, R., Ronse, K., Biesemans, S.

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Drawing without title von Roey, Léon van (née 1921) cartoonist, Roey, Léon van (f. 1921) bladtegner

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Drawing without title von Roey, Léon van (née 1921) cartoonist, Roey, Léon van (f. 1921) bladtegner

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Quality of life in children suffering from headaches: a systematic literature review von Ombashi, S., Tsangaris, E., Heeres, A. G., van Roey, V., Neuteboom, R. F., van Veelen-Vincent, M. L. C., Jansson, K., Mathijssen, I. M. J., Klassen, A. F., Versnel, S. L.

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