Surface modification of Si-containing polymers during etching for bilayer lithography von Eon, D., de Poucques, L., Peignon, M.C., Cardinaud, Ch, Turban, G., Tserepi, A., Cordoyiannis, G., Valamontes, E.S., Raptis, I., Gogolides, E.

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Molecular weight and processing effects on the dissolution properties of thin poly(methyl methacrylate) films von Kokkinis, A., Valamontes, E.S., Goustouridis, D., Ganetsos, Th, Beltsios, K., Raptis, I.

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Scanning X-ray microfluorescence in a SEM for the analysis of very thin overlayers von Valamontes, E.S., Statharas, J.C., Nomicos, C.

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Proton beam micromachined buried microchannels in negative tone resist materials von Rajta, I., Chatzichristidi, M., Baradács, E., Cserháti, C., Raptis, I., Manoli, K., Valamontes, E.S.

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Proton beam micromachining on strippable aqueous base developable negative resist von Rajta, I., Baradács, E., Chatzichristidi, M., Valamontes, E.S., Uzonyi, I., Raptis, I.

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Comparison of back-foil SXRF and EPMA for the elemental characterization of thin coatings von Valamontes, E.S., Statharas, J.C.

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Surface and line-edge roughness in plasma-developed resists von Tserepi, A., Valamontes, E.S., Tegou, E., Raptis, I., Gogolides, E.

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The helicoid multi-groove frictional pump as a direct compressor in the atmosphere under re-examination of the coefficient of the internal viscosity von Valamontes, S.E., Panos, C.N., Valamontes, E.S.

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Modification of polymer swelling by UV irradiation for use in chemical sensing von Goustouridis, D., Chatzandroulis, S., Raptis, I., Valamontes, E.S.

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The turbomolecular pump in molecular state von Antoniou, A.G., Valamontes, S.E., Panos, C.N., Valamontes, E.S.

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Resist plasma etching for 157 nm lithography von Eon, D., Cartry, G., Peignon, M.C., Cardinaud, Ch, Tserepi, A., Cordoyiannis, G., Valamontes, E.S., Raptis, I., Gogolides, E.

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