Beauty Always Recognizes Itself: A Roundtable on Sins Invalid von Berne, Patricia, Lewis, Jamal T., Milbern, Stacey, Shanks, Malcolm, Vaid-Menon, Alok, Wong, Alice

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Exhibit Me / Prohibit Me von Vaid-Menon, Alok

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Communication-Copper Grain Growth and Texture Formation in Copper-Titanium Thin Films von Faheem, Mohammad, Giridharan, Rudy Ratnadurai, Dai, Xintuo, Vaid, Alok

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Feminist Coalition and Queer Movements across Time: A CONVERSATION BETWEEN ALOK VAID-MENON AND URVASHI VAID von Alok Vaid-Menon, Urvashi Vaid

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Composition measurement of tri-layer SiGe stack using broadband spectroscopic ellipsometry von Haensel, Leander, Ygartua, Carlos, Shu, Frank, Haupt, Ronny, Anderson, Michael, Birk, Felipe Tijiwa, Vaid, Alok

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Three-dimensional scatterometry for measuring dielectric thickness von Timoney, Padraig, Vaid, Alok

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FUTURE/PRESENT: Arts in a Changing America von Daniela Alvarez, Roberta Uno, Elizabeth M. Webb

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ETCHING SYSTEM AND METHOD FOR FORMING MULTIPLE POROUS SEMICONDUCTOR REGIONS WITH DIFFERENT OPTICAL AND STRUCTURAL PROPERTIES ON A SINGLE SEMICONDUCTOR WAFER von ZANGOOIE, SHAHIN, SENDELBACH, MATTHEW, JOSEPH, VAID, ALOK, VAID

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Systems and methods of controlling a manufacturing process for a microelectronic component von Iddawela, Givantha, Vaid, Alok

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THREE-DIMENSIONAL SCATTEROMETRY FOR MEASURING DIELECTRIC THICKNESS von TIMONEY, Padraig, VAID, Alok

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Improved scatterometry time to solution for leading-edge logic applications von Vaid, Alok, Sendelbach, Matthew, Komarov, Serguei, Dziura, Ted, Ferns, Jason, Madsen, Jon

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Three-dimensional scatterometry for measuring dielectric thickness von Timoney Padraig, Vaid Alok

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Feminist Coalition and Queer Movements across Time: A Conversation between Alok Vaid-Menon and Urvashi Vaid von Vaid-Menon, Alok, Vaid, Urvashi

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Method and system for non-destructive metrology of thin layers von Pois, Heath A, Bozdog, Cornel, Vaid, Alok, Lee, Wei Ti, Klare, Mark

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THREE-DIMENSIONAL SCATTEROMETRY FOR MEASURING DIELECTRIC THICKNESS von VAID Alok, TIMONEY Padraig

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Characterization methodology to support process development of advanced patterning structures von Mishra, Shailendra, Vaid, Alok, Lin Zhou, Hyunchul Jung, Liping Cui, Luo Meng, Shi Yong Ju, Thaung-Htun Oo, Wen Pin Peng, Jesper, Yue Hu, Xuefeng Zeng, Han Taejoon, Bozdog, Cornel, Isbester, Paul, Cohen, Oded

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SYSTEMS AND METHODS OF CONTROLLING A MANUFACTURING PROCESS FOR A MICROELECTRONIC COMPONENT von Iddawela Givantha, Vaid Alok

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Apparatus and related method to control radiation transmission through mask pattern von Hall, Ezra D. B, Rankin, Jed H, Vaid, Alok

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Process control of semiconductor fabrication based on spectra quality metrics von Kagalwala, Taher, Yogev, Shay, Isbester, Paul, Sendelbach, Matthew, Vaid, Alok, Etzioni, Yoav

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MEASURING COMPLEX STRUCTURES IN SEMICONDUCTOR FABRICATION von MAHENDRAKAR, SRIDHAR, SENDELBACH, MATTHEW, KAGALWALA, TAHER, VAID, ALOK

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