Silicon precursor development for advanced dielectric barriers for VLSI technology von Mallikarjunan, Anupama, Johnson, Andrew D., Matz, Laura, Vrtis, Raymond N., Derecskei-Kovacs, Agnes, Jiang, Xuezhong, Xiao, Manchao

Volltext

Lewis base adducts of uranium triiodide: a new class of synthetically useful precursors for trivalent uranium chemistry von Clark, David L, Sattelberger, Alfred P, Bott, Simon G, Vrtis, Raymond N

Volltext

Mechanistic studies of the reductive coupling of carbon monoxide in seven-coordinate niobium(I) and tantalum(I) dicarbonyl complexes von Vrtis, Raymond N, Liu, Shuncheng, Rao, C. Pulla, Bott, Simon G, Lippard, Stephen J

Volltext

Carbynes generated from metal carbonyl and isocyanide complexes; intermediates in the reductive coupling of carbonyl and CNR ligands von Vrtis, Raymond N, Rao, C. Pulla, Warner, Steve, Lippard, Stephen J

Volltext

Kinetics of copper drift in low-κ polymer interlevel dielectrics von Loke, A.L.S., Wetzel, J.T., Townsend, P.H., Tanabe, T., Vrtis, R.N., Zussman, M.P., Kumar, D., Ryu, C., Wong, S.S.

Volltext

COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM von RIDGEWAY, ROBERT G, VRTIS, RAYMOND N

Volltext bestellen

Synthesis and stabilization of tantalum-coordinated dihydroxyacetylene from two reductively coupled carbon monoxide ligands von Vrtis, Raymond N, Rao, C. Pulla, Bott, Simon G, Lippard, Stephen J

Volltext

Linear carbonyl-bridged, dinuclear tantalum siloxycarbyne complexes. [Erratum to document cited in CA116(5):41629u] von Vrtis, Raymond N, Bott, Simon G, Lippard, Stephen J

Volltext

BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS von LEI, Xinjian, KIM, Moo-sung, CHANDRA, Haripin, VRTIS, Raymond N

Volltext bestellen

Linear carbonyl-bridged, dinuclear tantalum siloxycarbyne complexes von Vrtis, Raymond N, Bott, Simon G, Lippard, Stephen J

Volltext

Porous low k structural design to meet next generation interconnect needs von Matz, Laura, Haas, Mary K, Vrtis, Raymond N, Xuezhong Jiang, Aiping Wu, Rao, Madhukar B, O'Neill, Mark L

Volltext

COMPOSITIONS AND METHODS FOR DEPOSITING SILICON-CONTAINING FILMS von RIDGEWAY, ROBERT G, LI, MING, VRTIS, RAYMOND N, XIAO, MANCHAO, LEI, XINJIAN

Volltext bestellen

Methods for depositing silicon-containing films von Lei, Xinjian, Xiao, Manchao, Ridgeway, Robert G, Vrtis, Raymond N, Li, Ming

Volltext bestellen

STABLE ALKENYL OR ALKYNYL-CONTAINING ORGANOSILICON PRECURSOR COMPOSITIONS von VRTIS, Raymond, N, RAO, Madhukar, B, WANG, Meiliang, LEI, Xinjian, RIDGEWAY, Robert, G, OSTERWALDER, Neil, XIAO, Manchao, MAYORGA, Steve, Gerard

Volltext bestellen

COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM von RIDGEWAY, Robert G, VRTIS, Raymond N, RAO, Madhukar B

Volltext bestellen

STABLE ALKENYL OR ALKYNYL-CONTAINING ORGANOSILICON PRECURSOR COMPOSITIONS von VRTIS, Raymond, N, RAO, Madhukar, B, WANG, Meiliang, LEI, Xinjian, RIDGEWAY, Robert, G, OSTERWALDER, Neil, XIAO, Manchao, MAYORGA, Steve, Gerard

Volltext bestellen

STABLE ALKENYL OR ALKYNYL-CONTAINING ORGANOSILICON PRECURSOR COMPOSITIONS von VRTIS, Raymond, N, RAO, Madhukar, B, WANG, Meiliang, LEI, Xinjian, RIDGEWAY, Robert, G, OSTERWALDER, Neil, XIAO, Manchao, MAYORGA, Steve, Gerard

Volltext bestellen

NEW PRECURSORS FOR DEPOSITING FILMS WITH HIGH ELASTIC MODULUS von SPENCE, Daniel P, ENTLEY, William Robert, LEI, Xinjian, ACHTYL, Jennifer Lynn Anne, VRTIS, Raymond N, XIAO, Manchao, RIDGEWAY, Robert Gordon

Volltext bestellen

COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM von RIDGEWAY, Robert G, VRTIS, Raymond N, RAO, Madhukar B

Volltext bestellen

STABLE ALKENYL OR ALKYNYL-CONTAINING ORGANOSILICON PRECURSOR COMPOSITIONS von OSTERWALDER, NEILL, RIDGEWAY, ROBERT G, VRTIS, RAYMOND N, XIAO, MANCHAO, WANG, MEILIANG, RAO, MADHUKAR B, MAYORGA, STEVEN GERARD, LEI, XINJIAN

Volltext bestellen