Effect of SiO2 surface conditions on the diffusion and interaction of co-implanted In and As atoms von Tyschenko, Ida, Voelskow, Matthias, Cherkov, Alexander

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Ultra-doped n-type germanium thin films for sensing in the mid-infrared von Prucnal, Slawomir, Liu, Fang, Voelskow, Matthias, Vines, Lasse, Rebohle, Lars, Lang, Denny, Berencén, Yonder, Andric, Stefan, Boettger, Roman, Helm, Manfred, Zhou, Shengqiang, Skorupa, Wolfgang

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Challenges and Opportunities for Online Simulations for Process Performance Monitoring at Covestro von Bratfisch, C., Palagonia, M. S., Voelskow, K.

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Prospective mixed-methods study evaluating the potential of a voicebot (CovBot) to relieve German health authorities during the COVID-19 infodemic von Voelskow, Vanessa, Meßner, Claudia, Kurth, Tobias, Busam, Amelie, Glatz, Toivo, Ebert, Natalie

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Diffusion of In Atoms in SiO2 Films Implanted with As+ Ions von Tyschenko, I. E., Voelskow, M., Si, Zh, Popov, V. P.

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Superconducting state in a gallium-doped germanium layer at low temperatures von Herrmannsdörfer, T, Heera, V, Ignatchik, O, Uhlarz, M, Mücklich, A, Posselt, M, Reuther, H, Schmidt, B, Heinig, K-H, Skorupa, W, Voelskow, M, Wündisch, C, Skrotzki, R, Helm, M, Wosnitza, J

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Ex situ n+ doping of GeSn alloys via non-equilibrium processing von Prucnal, S, Berencén, Y, Wang, M, Rebohle, L, Böttger, R, Fischer, I A, Augel, L, Oehme, M, Schulze, J, Voelskow, M, Helm, M, Skorupa, W, Zhou, S

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Diffusion of In Atoms in SiO.sub.2 Films Implanted with As.sup.+ Ions von Tyschenko, I. E, Voelskow, M, Si, Zh, Popov, V. P

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Silicon films with gallium-rich nanoinclusions: from superconductor to insulator von Heera, V, Fiedler, J, Hübner, R, Schmidt, B, Voelskow, M, Skorupa, W, Skrotzki, R, Herrmannsdörfer, T, Wosnitza, J, Helm, M

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Diffusion and Interaction of In and As Implanted into SiO2 Films von Tyschenko, I. E., Voelskow, M., Mikhaylov, A. N., Tetelbaum, D. I.

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In situ ohmic contact formation for n-type Ge via non-equilibrium processing von Prucnal, S, Frigerio, J, Napolitani, E, Ballabio, A, Berencén, Y, Rebohle, L, Wang, M, Böttger, R, Voelskow, M, Isella, G, Hübner, R, Helm, M, Zhou, S, Skorupa, W

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Liquid phase epitaxy of binary III–V nanocrystals in thin Si layers triggered by ion implantation and flash lamp annealing von Wutzler, Rene, Rebohle, Lars, Prucnal, Slawomir, Bregolin, Felipe L., Hübner, Rene, Voelskow, Matthias, Helm, Manfred, Skorupa, Wolfgang

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The influence of kinetics, mass transfer and catalyst deactivation on the growth rate of multiwalled carbon nanotubes from ethene on a cobalt-based catalyst von Voelskow, Kristian, Becker, Michael J., Xia, Wei, Muhler, Martin, Turek, Thomas

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High-fluence Ga-implanted silicon—The effect of annealing and cover layers von Fiedler, J., Heera, V., Hübner, R., Voelskow, M., Germer, S., Schmidt, B., Skorupa, W.

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Electron Paramagnetic Resonance in Ge/Si Heterostructures with Mn-Doped Quantum Dots von Zinovieva, A. F., Zinovyev, V. A., Stepina, N. P., Katsuba, A. V., Dvurechenskii, A. V., Gutakovskii, A. K., Kulik, L. V., Bogomyakov, A. S., Erenburg, S. B., Trubina, S. V., Voelskow, M.

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SARS-CoV-2 infection and transmission in school settings during the second COVID-19 wave: a cross-sectional study, Berlin, Germany, November 2020 von Theuring, Stefanie, Thielecke, Marlene, van Loon, Welmoed, Hommes, Franziska, Hülso, Claudia, von der Haar, Annkathrin, Körner, Jennifer, Schmidt, Michael, Böhringer, Falko, Mall, Marcus A, Rosen, Alexander, von Kalle, Christof, Kirchberger, Valerie, Kurth, Tobias, Seybold, Joachim, Mockenhaupt, Frank P

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Superconductor-insulator transition controlled by annealing in Ga implanted Si von Heera, V., Fiedler, J., Voelskow, M., Mücklich, A., Skrotzki, R., Herrmannsdörfer, T., Skorupa, W.

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Modelling of flash-lamp-induced crystallization of amorphous silicon thin films on glass von Smith, M., McMahon, R., Voelskow, M., Panknin, D., Skorupa, W.

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Specific features of the ion-beam synthesis of Ge nanocrystals in SiO2 thin films von Tyschenko, I. E., Cherkov, A. G., Volodin, V. A., Voelskow, M.

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Heavily Ga-doped germanium layers produced by ion implantation and flash lamp annealing: Structure and electrical activation von Heera, V., Mücklich, A., Posselt, M., Voelskow, M., Wündisch, C., Schmidt, B., Skrotzki, R., Heinig, K. H., Herrmannsdörfer, T., Skorupa, W.

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