Unusual Modification of CuCl or CuBr Films by He Plasma Exposure Resulting in Nanowire Formation von Dictus, Dries, Baklanov, Mikhail R, Pikulev, Vitaly, De Gendt, Stefan, Vinckier, Christiaan, Boullart, Werner, Vanhaelemeersch, Serge

Volltext

Unusual Modification of CuCl or CuBr Films by He Plasma Exposure Resulting in Nanowire Formation von Dictus, Dries, Baklanov, Mikhail R, Pikulev, Vitaly, De Gendt, Stefan, Vinckier, Chris, Boullart, Werner, Vanhaelemeersch, Serge

Volltext

Unusual Modification of CuCl or CuBr Films by He Plasma Exposure Resulting in Nanowire Formation von DICTUS, Dries, BAKLANOV, Mikhail R, PIKULEV, Vitaly, DE GENDT, Stefan, VINCKIER, Chris, BOULLART, Werner, VANHAELEMEERSCH, Serge

Volltext

A PROCESS FOR WAFER BONDING von VISKER, Jakob, VANHAELEMEERSCH, Serge, PENG, Lan, DANG THI THUY, Chi, HUMBERT, Aurelie, VISKER, Evert

Volltext bestellen

Process for Wafer Bonding von Humbert, Aurelie, Dang Thi Thuy, Chi, Peng, Lan, Vanhaelemeersch, Serge, Visker, Evert, Visker, Jakob

Volltext bestellen

The etchback approach: Enlarged process window for MuGFET gate etching von Degroote, Bart, Collaert, Nadine, Rooyackers, Rita, Baklanov, Mikhail R., Boullart, Werner, Kunnen, Eddy, Jurczak, Malgorzata, Vanhaelemeersch, Serge

Volltext

High aspect ratio via etch von Struyf, Herbert, Vanhaelemeersch, Serge, Van Aelst, Joke

Volltext bestellen

Wet Etch Characteristics of Hafnium Silicate Layers von Claes, Martine, Paraschiv, Vasile, Dictus, Dries, Conard, Thierry, Boullart, Werner, Vanhaelemeersch, Serge, De Gendt, Stefan, Delabie, Annelies, Van Elshocht, Sven, Zhao, Chao, Everaert, Jean-Luc

Volltext

Mass Metrology for controlling and understanding processes von Kunnen, E., Vecchio, G., Redolfi, A., Everaert, J.-L., Delabie, A., Xiaoping Shi, Vanhaelemeersch, S., Cunnane, L., Kiermansz, A.

Volltext

Protective treatment for porous materials von BAKLANOV, MIKHAÏL, IACOPI, FRANCESCA, VANHAELEMEERSCH, SERGE

Volltext bestellen

HF Based Solutions for HfO2 Removal; Effect of pH and Temperature on HfO2: SiO2 Etch Selectivity von Claes, Martine, De Gendt, Stefan, Boullart, Werner, Paraschiv, Vasile, Vanhaelemeersch, Serge, Baklanov, Mikhail R.

Volltext

Silicon Surface Cleaning after Spacer Dry Etching von Vanhaelemeersch, Serge, Shamiryan, Denis, Baklanov, Mikhail R.

Volltext

Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson HighlandsTM Chamber von Conard, Thierry, Boullart, Werner, Schmidt, M., Hendrickx, D., Van Aelst, Jan, Vanhaelemeersch, Serge, Stucchi, M., Mannaert, G., Van Cauwenberghe, Marc

Volltext

Protective treatment for porous materials von BAKLANOV MIKHAIL, IACOPI FRANCESCA, VANHAELEMEERSCH SERGE

Volltext bestellen

Protective treatment for porous materials von IACOPI, FRANCESCA, VANHAELEMEERSCH, SERGE, BAKLANOV, MIKHAIL

Volltext bestellen

PROTECTIVE TREATMENT FOR POROUS MATERIALS von BAKLANOV MIKHAIL, IACOPI FRANCESCA, VANHAELEMEERSCH SERGE

Volltext bestellen

Modification of Low-K SiCOH Film Porosity by a HF Solution von Shamiryan, Denis, Vanhaelemeersch, Serge, Vereecke, Guy, Maex, Karen, Baklanov, Mikhail R.

Volltext

Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric von Alaerts, C., Vanhaelemeersch, Serge, Lanckmans, F., Maex, Karen, Baklanov, Mikhail R.

Volltext

METHOD FOR REMOVAL OF SIC von MEYNEN, HERMAN, DEMBOWSKI, PHILIP, DAVID, VANHAELEMEERSCH, SERGE

Volltext bestellen

Alternative dual damascene patterning approach von VAN HOVE, MARLEEN, STRUYF, HERBERT, VAN OLMEN, JAN, HENDRICKX, DIRK, BOULLART, WERNER, VANHAELEMEERSCH, SERGE

Volltext bestellen