EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology von Beckers, Job, van de Ven, Tijn, van der Horst, Ruud, Astakhov, Dmitry, Banine, Vadim

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Plasma sources for EUV lithography exposure tools von Banine, Vadim, Moors, Roel

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Extreme ultraviolet lithography: Status and prospects von Benschop, Jos, Banine, Vadim, Lok, Sjoerd, Loopstra, Erik

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Plasma sources for EUV lithography exposure tools : Special cluster on extreme ultraviolet light sources for semiconductor manufacturing von BANINE, Vadim, MOORS, Roel

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Research and development in short-wave radiation sources for new-generation lithography von Koshelev, Konstantin N, Banine, Vadim E, Salashchenko, Nikolai N

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EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner von van de Kerkhof, Mark, Yakunin, Andrei M, Astakhov, Dmitry, van Kampen, Maarten, van der Horst, Ruud, Banine, Vadim

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Scientific Session of the Physical Sciences Division of the Russian Academy of Sciences (31 January 2007) von Koshelev, Konstantin N, Banine, Vadim E, Salashchenko, Nikolai N, Balykin, Viktor I, Lozovik, Yurii E, Popov, Andrei M

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Lithographic apparatus von Achanta, Satish, Van De Kerkhof, Marcus Adrianus, Moors, Johannes Hubertus Josephina, Banine, Vadim Yevgenyevich, Janssens, Stef Marten Johan, Nikipelov, Andrey

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LITHOGRAPHY APPARATUS AND METHOD von BANINE, Vadim, NIKIPELOV, Andrey, VAN DE KERKHOF, Marcus, VAN DER WOORD, Ties, CLOIN, Christian

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METHODS AND APPARATUS FOR OPTICAL METROLOGY von BANINE, Vadim, SMORENBURG, Petrus, BRUSSAARD, Gerrit

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Addendum to `Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy von Platier, Bart, Ferdi van de Wetering, Mark van Ninhuijs, Brussaard, Seth, Banine, Vadim, Luiten, Jom, Beckers, Job

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A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER HAVING IMPROVED RESISTANCE TO PEELING OFF von WRICKE, Sandro, NIKIPELOV, Andrey, STAS, Roland Johannes Wilhelmus, KLUGKIST, Joost André, NASALEVICH, Maxim Aleksandrovich, BANINE, Vadim Yevgenyevich

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Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface level... von Banine, Vadim Yevgenyevich, Scaccabarozzi, Luigi, Nienhuys, Han-Kwang

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GRAZING INCIDENCE REFLECTOR, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING A GRAZING INCIDENCE REFLECTOR AND METHOD FOR MANUFACTURING A DEVICE von BANINE, Vadim, YAKUNIN, Andrei, FRIJNS, Olav

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A LITHOGRAPHIC APPARATUS von Achanta, Satish, Van De Kerkhof, Marcus Adrianus, Moors, Johannes Hubertus Josephina, Banine, Vadim Yevgenyevich, Janssens, Stef Marten Johan, Nikipelov, Andrey

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FLY'S EYE INTEGRATOR, ILLUMINATOR, LITHOGRAPHIC APPARATUS AND METHOD von BANINE, VADIM

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Imprint lithography von Wuister Sander Frederik, Banine Vadim Yevgenyevich

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Methods and apparatus for optical metrology von Brussaard, Gerrit Jacobus Hendrik, Banine, Vadim Yevgenyevich, Smorenburg, Petrus Wilhelmus

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MEMBRANE CLEANING APPARATUS von BANINE, Vadim, NIKIPELOV, Andrey, DE VRIES, Gosse, BLOM, Sander, SBRIZZAI, Fabio, NIENHUYS, Han-Kwang

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A LITHOGRAPHIC APPARATUS von BANINE, Vadim, NIKIPELOV, Andrey, JANSSENS, Stef, VAN DE KERKHOF, Marcus, ACHANTA, Satish, MOORS, Johannes

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