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Plasma processing of low-k dielectrics
Veröffentlicht in Journal of applied physics
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Effect of UV wavelength on the hardening process of porogen-containing and porogen-free ultralow- k plasma-enhanced chemical vapor deposition dielectrics
Veröffentlicht in Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
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Effect of UV wavelength on the hardening process of porogen-containing and porogen-free ultralow- k plasma-enhanced chemical vapor deposition dielectricsa
Veröffentlicht in Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
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Risk Assessment of Innovation Prototype for the Example Hydraulic Cylinder
Veröffentlicht in Sustainability
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