Application of cyclic fluorocarbon/argon discharges to device patterning von Metzler, Dominik, Uppiredi, Kishore, Bruce, Robert L., Miyazoe, Hiroyuki, Zhu, Yu, Price, William, Sikorski, Ed S., Li, Chen, Engelmann, Sebastian U., Joseph, Eric A., Oehrlein, Gottlieb S.

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