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  1. 1
    Abrasive and additive interactions in high selectivity STI CMP slurries

    Abrasive and additive interactions in high selectivity STI CMP slurries von Praveen, B.V.S., Manivannan, R., Umashankar, T.D., Cho, Byoung-Jun, Park, Jin-Goo, Ramanathan, S.

    Veröffentlicht in Microelectronic engineering

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  2. 2
    UV VIS Studies of Ce(III)/Ce(IV) Redox Reactions to Understand Abrasive and Work Surface Interactions during STI CMP

    UV VIS Studies of Ce(III)/Ce(IV) Redox Reactions to Understand Abrasive and Work Surface Interactions during STI CMP von T.D., Umashankar, Ramanathan, S


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