Recent Trend of Advanced LSI Packaging: Introduction for application of polymers von Ueno, Takumi

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Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spect... von Ueno, Takumi

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The Photopolymer Science and Technology Award von Ueno, Takumi

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Wheel Velocity Based Cascade Driving Force Control for Electric Vehicles von Ueno, Takumi, Nguyen, Binh-Minh, Nagai, Sakahisa, Fujimoto, Hiroshi

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The Photopolymer Science and Technology Award von Hanabata, Makoto

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Continuous catalytic reduction of p-nitrophenol confined within two-dimensional nanochannels in laminar MoS2 membranes von Nakagawa, Keizo, Ueno, Takumi, Wang, Zheng, Yoshioka, Tomohisa, Kulhavy, Jiri, Taniya, Keita, Matsuoka, Atsushi, Kamio, Eiji, Tsang, Shik Chi Edman, Matsuyama, Hideto

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Special Issue Preface of Directed Self Assembly (DSA) von Ueno, Takumi, Nagahara, Seiji

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Influence of Viscosity on Photopolymerization in Film as Studied by Real Time FTIR von Nicolas, Alexandre, Ueno, Takumi

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The Photopolymer Science and Technology Award von Allen, Robert D.

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New Polyimides Coating Technology for Next Generation Semiconductor Application von Katoh, Kohji, Ohe, Masayuki, Komatsu, Hiroshi, Motobe, Takeharu, Hattori, Takashi, Ueno, Takumi

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The Photopolymer Science and Technology Award von Ueno, Takumi

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Low Temperature Curing of Polyimide Precursors by Variable Frequency Microwave von Matsutani, Hiroshi, Hattori, Takashi, Ohe, Masayuki, Ueno, Takumi, Hubbard, Robert L., Fathi, Zak

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ACID-CATALYZED REACTIONS OF TETRAHYDROPYRANYL-PROTECTED POLYVINYLPHENOL IN A NOVOLAK-RESIN-BASED POSITIVE RESIST von SAKAMIZU, T, SHIRAISHI, H, YAMAGUCHI, H, UENO, T, HAYASHI, N

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The Photopolymer Science and Technology Award von Bowden, Murrae J.

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Determination of acid diffusion in chemical amplification positive deep-UV resists von SCHLEGEL, L, UENO, T, HAYASHI, N, IWAYANAGI, T

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The Photopolymer Science and Technology Award von Janes, Dustin W., Inoue, Takejiro, McCoy, Bradley D., Madan, Ishita, Nealey, Paul F., Willson, C. Grant, Ellison, Christopher J.

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Dissolution Inhibitory Effect of Urea Additives on a Carboxyl Polymer Through a Supramolecular Structure von Maekawa, Yasunari, Ueno, Takumi, Miwa, Takao, Okabe, Yoshiaki, Rames-Langlade, Géraldine

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The Photopolymer Science and Technology Award von Kato, Hirokazu, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Kanno, Masahiro, Kobayashi, Katsutoshi, Kawanishi, Ayako, Imamura, Tsubasa, Omura, Mitsuhiro, Nakamura, Naofumi, Azuma, Tsukasa

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DELAY-FREE DEPROTECTION APPROACH TO ROBUST CHEMICALLY AMPLIFIED RESIST von Hattori, Takashi, Imai, Akira, Yamanaka, Ryoko, Ueno, Takumi, Shiraishi, Hiroshi

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Special Issue/Recent Trend and Future of Photoresists for Microlithography. Chemical Amplification Resist Trend von UENO, Takumi

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