Ultrafast farfield simulation of non-paraxial computer generated holograms von Linss, Sebastian, Michaelis, Dirk, Zeitner, Uwe D

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Second harmonic generation under doubly resonant lattice plasmon excitation von Beer, Sebastian, Gour, Jeetendra, Alberucci, Alessandro, David, Christin, Nolte, Stefan, Zeitner, Uwe D.

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Enhancement of third harmonic generation induced by surface lattice resonances in plasmonic metasurfaces von Gour, Jeetendra, Beer, Sebastian, Alberucci, Alessandro, Zeitner, Uwe D, Nolte, Stefan

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Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect von Stuerzebecher, Lorenz, Harzendorf, Torsten, Vogler, Uwe, Zeitner, Uwe D, Voelkel, Reinhard

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Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5 nm wavelength von Eschen, Wilhelm, Liu, Chang, Steinert, Michael, Penagos Molina, Daniel S, Siefke, Thomas, Zeitner, Uwe D, Kasper, Jörg, Pertsch, Thomas, Limpert, Jens, Rothhardt, Jan

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Measuring the spatiotemporal electric field of tightly focused ultrashort pulses with sub-micron spatial resolution von Bowlan, Pamela, Fuchs, Ulrike, Trebino, Rick, Zeitner, Uwe D

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Beam homogenizers based on chirped microlens arrays von Wippermann, Frank, Zeitner, Uwe-D, Dannberg, Peter, Bräuer, Andreas, Sinzinger, Stefan

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Laser-lithography on non-planar surfaces von Radtke, Daniela, Zeitner, Uwe D

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Large-scale segmentation errors in optical gratings and their unique effect onto optical scattering spectra von Heusinger, Martin, Flügel-Paul, Thomas, Zeitner, Uwe-Detlef

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Fabrication of nanometre sized gratings via ion irradiation von Kaufmann, Johannes, Schrempel, Frank, Zeitner, Uwe

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High efficiency transmission grating for the ESO CUBES UV spectrograph von Zeitner, Uwe D., Dekker, Hans, Burmeister, Frank, Flügel-Paul, Thomas, Bianco, Andrea, Zanutta, Alessio

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Switchable optics based on guided mode resonance in lithographically patterned vanadium dioxide with integrated heating layer von Walther, Markus, Siefke, Thomas, Gerold, Kristin, Zeitner, Uwe D.

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Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources von Trost, Marcus, Schröder, Sven, Duparré, Angela, Risse, Stefan, Feigl, Torsten, Zeitner, Uwe D, Tünnermann, Andreas

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High-resolution proximity lithography for nano-optical components von Stuerzebecher, Lorenz, Fuchs, Frank, Zeitner, Uwe D., Tuennermann, Andreas

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Mode shaping in semiconductor broad area lasers by monolithically integrated phase structures von Eckstein, Hans-Christoph, Zeitner, Uwe D, Tünnermann, Andreas, Schmid, Wolfgang, Strauss, Uwe, Lauer, Christian

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Advanced mask aligner lithography: new illumination system von Voelkel, Reinhard, Vogler, Uwe, Bich, Andreas, Pernet, Pascal, Weible, Kenneth J, Hornung, Michael, Zoberbier, Ralph, Cullmann, Elmar, Stuerzebecher, Lorenz, Harzendorf, Torsten, Zeitner, Uwe D

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Pulse compression grating fabrication by diffractive proximity photolithography von Stuerzebecher, Lorenz, Fuchs, Frank, Harzendorf, Torsten, Zeitner, Uwe D

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Fabrication influences on a miniaturised stokes polarimeter consisting of stacked nano-optical wire grid polarizer and retarders von Siefke, Thomas, Walther, Markus, Stock, Carsten, Zeitner, Uwe D.

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Switchable optics based on guided mode resonance in lithographically patterned vanadium dioxide von Walther, Markus, Siefke, Thomas, Gerold, Kristin, Zeitner, Uwe D.

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250  nm period grating transferred by proximity i-line mask-aligner lithography von Bourgin, Yannick, Käsebier, Thomas, Zeitner, Uwe D

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