Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism von AARIK, J, AIDLA, A, MÄNDAR, H, UUSTARE, T

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Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films von AARIK, J, AIDLA, A, KIISLER, A.-A, UUSTARE, T, SAMMELSELG, V

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Gas sensing properties of epitaxial SnO2 thin films prepared by atomic layer deposition von Rosental, A., Tarre, A., Gerst, A., Sundqvist, J., Hårsta, A., Aidla, A., Aarik, J., Sammelselg, V., Uustare, T.

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Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon von Dueñas, S., Castán, H., García, H., de Castro, A., Bailón, L., Kukli, K., Aidla, A., Aarik, J., Mändar, H., Uustare, T., Lu, J., Hårsta, A.

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Refractive index gradients in TiO2 thin films grown by atomic layer deposition von Kasikov, A, Aarik, J, Mändar, H, Moppel, M, Pärs, M, Uustare, T

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A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition von Dueñas, S, Castán, H, García, H, Andrés, E San, Toledano-Luque, M, Mártil, I, González-Díaz, G, Kukli, K, Uustare, T, Aarik, J

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Structural characterization of TiO2-Cr2O3 nanolaminates grown by atomic layer deposition von SAMMELSELG, V, TARRE, A, LU, J, AARIK, J, NIILISLC, A, UUSTARE, T, NETSIPAILO, I, RAMMULA, R, PÄRNA, R, ROSENTAL, A

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Nanocrystalline Cr2O3–TiO2 thin films by pulsed laser deposition von Jantson, T, Avarmaa, T, Mandar, H, Uustare, T, Jaaniso, R

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Ti 2p and O 1s X-ray absorption of TiO2 polymorphs von RUUS, R, KIKAS, A, SAAR, A, AUSMEES, A, NOMMISTE, E, AARIK, J, AIDLA, A, UUSTARE, D. T, MARTINSON, I

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Atomic-layer chemical vapor deposition of SnO2 for gas-sensing applications von Rosental, A, Tarre, A, Gerst, A, Uustare, T, Sammelselg, V

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Nanoepitaxy of SnO2 on α-Al2O3(012) von Tarre, A., Rosental, A., Sundqvist, J., Hårsta, A., Uustare, T., Sammelselg, V.

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TiO2 thin films by atomic layer deposition : a case of uneven growth at low temperature von SAMMELSELG, V, ROSENTAL, A, TARRE, A, NIINISTÖ, L, HEISKANEN, K, ILMONEN, K, JOHANSSON, L.-S, UUSTARE, T

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TiO 2 thin films by atomic layer deposition: a case of uneven growth at low temperature von Sammelselg, V, Rosental, A, Tarre, A, Niinistö, L, Heiskanen, K, Ilmonen, K, Johansson, L.-S, Uustare, T

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Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor von Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Forsgren, Katarina, Sundqvist, Jonas, Hårsta, Anders, Uustare, Teet, Mändar, Hugo, Kiisler, Alma-Asta

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Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2 von Kukli, K., Ritala, M., Schuisky, M., Leskelä, M., Sajavaara, T., Keinonen, J., Uustare, T., Hårsta, A.

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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process von Aarik, Jaan, Aidla, Aleks, Uustare, Teet, Ritala, Mikko, Leskelä, Markku

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Influence of growth temperature on properties of zirconium dioxide films grown by atomic layer deposition von Kukli, Kaupo, Ritala, Mikko, Aarik, Jaan, Uustare, Teet, Leskelä, Markku

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Influence of structure development on atomic layer deposition of TiO 2 thin films von Aarik, J., Karlis, J., Mändar, H., Uustare, T., Sammelselg, V.

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Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition von Aarik, Jaan, Aidla, Aleks, Mändar, Hugo, Sammelselg, Väino, Uustare, Teet

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Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition von Aarik, Jaan, Aidla, Aleks, Kiisler, Alma-Asta, Uustare, Teet, Sammelselg, Väino

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