SiO2 electret thin films prepared by various deposition methods von MINAMI, Tadatsugu, UTSUBO, Tetsuharu, YAMATANI, Tsuyoshi, MIYATA, Toshihiro, OHBAYASHI, Yoshiaki

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Inorganic electret using SiO2 thin films prepared by radio-frequency magnetron sputtering von Minami, Tadatsugu, Utsubo, Tetsuharu, Miyata, Toshihiro, Ohbayashi, Yoshiaki

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SiO 2 electret thin films prepared by various deposition methods von Minami, Tadatsugu, Utsubo, Tetsuharu, Yamatani, Tsuyoshi, Miyata, Toshihiro, Ohbayashi, Yoshiaki

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Inorganic electret using SiO 2 thin films prepared by radio-frequency magnetron sputtering von Minami, Tadatsugu, Utsubo, Tetsuharu, Miyata, Toshihiro, Ohbayashi, Yoshiaki

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((Y_2O_3)_<0.6>-(GeO_2)_<0.4>) : Mn Multicomponent Oxide Thin-Film EL Devices Prepared by Magnetron Sputtering von UTSUBO, Tetsuharu, KOBAYASHI, Youhei, MIYATA, Toshihiro, MINAMI, Tadatugu

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スパッタ法で作製した((Y2O3)0.6-(GeO2)0.4):Mn酸化物薄膜EL素子 von 靱 哲治, 小林 洋平, 宮田 俊弘

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