Electrostatic Properties of Ideal and Non-ideal Polar Organic Monolayers: Implications for Electronic Devices von Natan, A., Kronik, L., Haick, H., Tung, R. T.

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Oxide mediated epitaxy of CoSi2 on silicon von Tung, R. T.

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Electron transport of inhomogeneous schottky barriers : a numerical study von SULLIVAN, J. P, TUNG, R. T, PINTO, M. R, GRAHAM, W. R

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Electron transport of inhomogeneous Schottky barriers von Tung, R. T.

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Electron transport at metal-semiconductor interfaces : general theory von TUNG, R. T

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Chemical bonding and fermi level pinning at metal-semiconductor interfaces von Tung, R T

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Schottky-barrier formation at single-crystal metal-semiconductor interfaces von TUNG, R. T

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On the mechanism of nucleotide diphosphate activation of the ATP-sensitive K+ channel in ventricular cell of guinea-pig von Tung, R T, Kurachi, Y

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Comment on “Numerical study of electrical transport in homogeneous Schottky diodes” [J. Appl. Phys. 85 , 1935 (1999)] von Tung, R. T.

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Effect of ultrathin Mo and MoSix layer on Ti silicide reaction von Ohmi, S., Tung, R. T.

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Epitaxial CoSi2 and NiSi2 thin films von TUNG, R. T

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Epitaxial silicide interfaces in microelectronics von Tung, R T, Ohmi, S

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Increased uniformity and thermal stability of CoSi2 thin films by Ti capping von Tung, R. T., Schrey, F.

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Schottky-Barrier inhomogeneity at epitaxial NiSi2 interfaces on Si(100) von TUNG, R. T, LEVI, A. F. J, SULLIVAN, J. P, SCHREY, F

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Origin of the excess capacitance at intimate Schottky contacts von WERNER, J, LEVI, A. F. J, TUNG, R. T, ANZLOWAR, M, PINTO, M

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Surface nucleation of Ti silicides at elevated temperatures von Tung, R. T.

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Silicide formation in co-deposited TiSix layers : The effect of deposition temperature and Mo von OHMI, S, TUNG, R. T

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Topography of the Si(111) surface during silicon molecular-beam epitaxy von TUNG, R. T, SCHREY, F

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Essential Role of Nucleotide Diphosphates in Nicorandil-Mediated Activation of Cardiac ATP-Sensitive K+ Channel: A Comparison With Pinacidil and Lemakalim von Shen, Win K, Tung, Robert T, Machulda, Mary M, Kurachi, Yoshihisa

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Safety of implantation of a cardioverter-defibrillator without general anesthesia in an electrophysiology laboratory von Tung, Robert T., Bajaj, Ashok K.

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