Study of the hydride forming process of in-situ grown MgH2 thin films by activated reactive evaporation von Westerwaal, R.J., Broedersz, C.P., Gremaud, R., Slaman, M., Borgschulte, A., Lohstroh, W., Tschersich, K.G., Fleischhauer, H.P., Dam, B., Griessen, R.

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Study of the hydride forming process of in-situ grown MgH 2 thin films by activated reactive evaporation von Westerwaal, R.J., Broedersz, C.P., Gremaud, R., Slaman, M., Borgschulte, A., Lohstroh, W., Tschersich, K.G., Fleischhauer, H.P., Dam, B., Griessen, R.

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The beryllium limiter experiment in ISX-B von Mioduszewski, P.K, Edmonds, P.H, Bush, C.E, Carnevali, A, Clausing, R.E, Cook, T.B, Emerson, L.C, England, A.C, Gabbard, W.A, Heatherly, L, Hutchinson, D.P, Isler, R.C, Kindsfather, R.R, King, P.W, Langley, R.A, Lazarus, E.A, Ma, C.H, Murakami, M, Neilson, G.H, Roberto, J.B, Simpkins, J.E, Thomas, C.E, Wootton, A.J, Yokoyama, K, Zuhr, R.A, Behringer, K.H, Dietz, J, Källne, E, Lomas, P.J, Morgan, P.D, Stott, P.E, Tanga, A, Sonnenberg, K.H, Smith, M.F, Watkins, J, Watson, R.D, Whitley, J.B, Goodall, D.H.J, Peacock, N.J, Clayton, R, von Seggern, J, Tschersich, K.G

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Direct ion beam deposition of a-C:H films on refractory metals von Tschersich, K.G.

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Surface composition of high-nickel alloy after the impingement of atomic hydrogen at different temperatures von Seggern, J.v., Tschersich, K.G.

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Dependence of inconel surface composition on the influx of hydrogen atoms von Seggern, J.v., Tschersich, K.G.

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