The GROOP effect: Groups mimic group actions von Tsai, Jessica Chia-Chin, Sebanz, Natalie, Knoblich, Günther

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The mechanism of simultaneous implantation and sputtering by high energy oxygen ions during secondary ion mass spectrometry (SIMS) analysis von Tsai, J.C.C., Morabito, J.M.

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Shallow phosphorus diffusion profiles in silicon von Tsai, J.C.C.

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Visible interference effects in silicon caused by high-current–high-dose implantation von Seidel, T. E., Pasteur, G. A., Tsai, J. C. C.

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DIFFUSION OF IMPURITIES INTO SILICON THROUGH AN OXIDE LAYER von Thurston,M.O, Menon,R.B, Tsai,J.C.C

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Transistors with boron bases predeposited by ion implantation and annealed in various oxygen ambients von Seidel, T.E., Payne, R.S., Moline, R.A., Costello, W.R., Tsai, J.C.C., Gardner, K.R.

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