Site specific photochemical reaction by core electron excitation: carbon and oxygen K-edge fine structure of PMMA von Tinone, Marcia C.K., Sekitani, Tetsuji, Tanaka, K., Maruyama, Junya, Ueno, Nobuo

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Site specific photochemical reaction of PMMA and related polymers by inner shell electron excitation von Tinone, Marcia C.K., Ueno, Nobuo, Maruyama, Junya, Kamiya, Koji, Harada, Yoshiya, Sekitani, Tetsuji, Tanaka, Kenichiro

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Assembly of extreme ultraviolet lithography optics using at-wavelength Foucault testing von HAGA, T, TINONE, M. C. K

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Inner-shell excitation and site specific fragmentation of poly(methylmethacrylate) thin film von Tinone, Marcia C. K., Tanaka, Kenichiro, Maruyama, Junya, Ueno, Nobuo, Imamura, Motoyasu, Matsubayashi, Nobuyuki

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Soft X-ray multilayer beam splitters von Haga, Tsuneyuki, Tinone, Marcia C. K., Shimada, Masaru, Ohkubo, Takashi, Ozawa, Akira

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Multilayer sputter deposition stress control von Tinone, Marcia C.K., Haga, Tsuneyuki, Kinoshita, Hiroo

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Radiative dissociation of C2H2, C2HD, and C2D2 superexcited at 50–90 nm region von Ibuki, Toshio, Horie, Yasuhiko, Kamiuchi, Akira, Morimoto, Yoshikazu, Tinone, Marcia C. K., Tanaka, Kenichiro, Honma, Kenji

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Large-field (> 20 × 25 mm2) replication by EUV lithography von Haga, Tsuneyuki, Tinone, Marcia C.K., Takenaka, Hisataka, Kinoshita, Hiroo

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