Investigation of environmental stability in chemically amplified resists von Yoshino, H., Itani, T., Hashimoto, S., Yamana, M., Samoto, N., Kasama, K., Timko, A.G., Nalamasu, O.

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Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists von Houlihan, F. M., Kometani, J. M., Timko, A. G., Hutton, R. S., Gabor, A. H., Medina, A. N., Biafore, J. J., Slater, S. G.

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Revolutionary and evolutionary resist design concepts for 193 nm lithography von Nalamasu, O., Wallow, T.I., Reichmanis, E., Novembre, A.E., Houlihan, F.M., Dabbagh, G., Mixon, D.A., Hutton, R.S., Timko, A.G., Wood, O.R., Cirelli, R.A.

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Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing von Houlihan, F. M., Rushkin, I. L., Hutton, R. S., Timko, A. G., Reichmanis, E., Nalamasu, O., Gabor, A. H., Medina, A. N., Malik, S., Neiser, M., Kunz, R.R., Downs, D. K.

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0.25 μm trilevel lithography using KTI 747 negative resist for the planarizing layer von KUNG, E. H, TIMKO, A. G

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Sub-0.5 μm lithography using an excimer laser at 248 nm von KUNG, E. H, CHENG, M, NALAMASU, O, TIMKO, A. G, CASE, C. B, POL, V

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Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography von Timko, A. G., Frackoviak, J., Hopkins, L. C., Klemens, F. P., Trimble, L. E., Nalamasu, O., Watson, G. P., Mansfield, W. M., Barr, D., Li, J.

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Magnetic and Optical Studies on an S = 6 Ground-State Cluster [Cr12O9(OH)3(O2CCMe3)15]:  Determination of, and the Relationship Between, Single-Ion and Cluster Spin Hamiltonian Par... von Collison, David, Murrie, Mark, Oganesyan, Vasily S., Piligkos, Stergios, Poolton, Nigel R. J., Rajaraman, Gopalan, Smith, Graham M., Thomson, Andrew J., Timko, Grigore A., Wernsdorfer, Wolfgang, Winpenny, Richard E. P., McInnes, Eric J. L.

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A unified approach to resist materials design for the advanced lithographic technologies von NALAMASU, O, REICHMANIS, E, TIMKO, A. G, TARASCON, R, NOVEMBRE, A. E, SLATER, S, HOLZWARTH, H, FALCIGNO, P, MÜNZEL, N

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Sub-0.5 µm Lithography Using an Excimer Laser at 248 nm von Kung, E. H., Cheng, M., Nalamasu, O., Timko, A. G., C. B. Case, C. B. Case, V. Pol, V. Pol

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Material properties of spin-on silicon oxide (SOX) for fully recessed NMOS field isolation von SMOLINSKY, G, VAIDYA, S, LIFSHITZ, N, KORNBLIT, A, LEBOWITZ, J

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The kinetics and main pathways for the liquid-phase oxidation of cyclohexene by air in the presence of cobalt, chromium, iron, and nickel µ3-oxotrimetallohexapivalates von Chikhichin, D. G., Kotseruba, V. A., Gerbeleu, N. V., Timko, G. A., Malaeshtyan, Yu. L., Kamalov, G. L.

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Environmental stability of 193 nm single layer chemically amplified resists von Timko, A. G., Houlihan, F. M., Cirelli, R. A., Nalamasu, O., Yoshino, Hiroshi, Itani, Toshiro, Tanabe, Hiroyoshi, Kasama, Kunihiko

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Structure of palladium (II) pivalate von Batsanov, A. S., Timko, G. A., Struchkov, Yu. T., G rb l u, N. V., Indrichan, K. M., Popovich, G. A.

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A unified approach to resists materials design for the advanced lithographic technologies von Nalamasu, O., Reichmanis, E., Timko, A.G., Tarascon, R., Novembre, A.E., Slater, S., Holzwarth, H., Falcigno, P., Mu¨nzel, N.

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Liquid-phase oxidation of dibenzyl ether in the presence of homo- and heteronuclear chromium(III) μ3-oxotrimetalhexapivalates von Kotseruba, V. A., Chikhichin, D. G., Kamalov, G. L., Gérbéléu, N. V., Timko, G. A., Synzheryan, L. D.

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50 nm Vertical Replacement-Gate (VRG) pMOSFETs von Sang-Hyun Oh, Hergenrother, J.M., Nigam, T., Monroe, D., Klemens, F.P., Kornblit, A., Mansfield, W.M., Baker, M.R., Barr, D.L., Baumann, F.H., Bolan, K.J., Boone, T., Ciampa, N.A., Cirelli, R.A., Eaglesham, D.J., Ferry, E.J., Fiory, A.T., Frackoviak, J., Garno, J.P., Gossmann, H.J., Grazul, J.L., Green, M.L., Hillenius, S.J., Johnson, R.W., Keller, R.C., King, C.A., Kleiman, R.N., Lee, J.T.-C., Miner, J.F., Morris, M.D., Rafferty, C.S., Rosamilia, J.M., Short, K., Sorsch, T.W., Timko, A.G., Weber, G.R., Wilk, G.D., Plummer, J.D.

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Investigation of the volatile carboxylates of some platinum metals in the gaseous phase by electron-impact mass spectrometry von G rb l u, N. V., Timko, G. A., Indrichan, K. M., Popovich, G. A.

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Mass-spectrometric investigation of the carboxylates of oxovanadium(IV) von G rb l u, N. V., Popovich, G. A., Indrichan, K. M., Timko, G. A.

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Dianthus lumnitzeri Wiesb

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