Application of the acoustic-emission and strain-gaging methods to testing of the residual strength of airplanes von Ser’eznov, A. N., Stepanova, L. N., Tikhonravov, A. B., Kulikov, E. N., Kabanov, S. I., Lebedev, E. Yu, Kozhemyakin, V. L., Kareev, A. E.

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Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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Application of a large-scale molecular dynamics approach to modelling the deposition of TiO2 thin films von Grigoriev, F.V., Sulimov, V.B., Tikhonravov, A.V.

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Advanced algorithms for monochromatic monitoring of complex optical coatings von Tikhonravov, A, Lagutin, Iu, Lagutina, A, Romanov, B, Yagola, A

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Density functional modeling of structural and electronic properties of amorphous high temperature oxides von Sulimov, V.B., Kutov, D.C., Sulimov, A.V., Grigoriev, F.V., Tikhonravov, A.V.

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Atomistic simulation of the glancing angle deposition of SiO2 thin films von Grigoriev, F.V., Sulimov, V.B., Tikhonravov, A.V.

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Silicon Dioxide Thin Films Deposited Using Oxide Targets: Results of Atomistic Simulation von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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Structure of Highly Porous Silicon Dioxide Thin Film: Results of Atomistic Simulation von Grigoriev, F.V., Sulimov, V.B., Tikhonravov, A.V.

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Full-atomistic nanoscale modeling of the ion beam sputtering deposition of SiO2 thin films von Grigoriev, F.V., Sulimov, A.V., Katkova, E.V., Kochikov, I.V., Kondakova, O.A., Sulimov, V.B., Tikhonravov, A.V.

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Structure and properties of the low-energy deposited TiO2 thin films: results of the molecular dynamics simulation von Grigoriev, F.V., Sulimov, V.B., Tikhonravov, A.V.

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Combined Modeling of the Optical Anisotropy of Porous Thin Films von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A.V.

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Differences in the properties of fused silica and silicon dioxide films: results of the atomistic simulation von Grigoriev, F V, Sulimov, V B, Tikhonravov, A V

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High-Performance Large-Scale Atomistic Simulation of Thin Films Deposition von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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High-performance Atomistic Simulation of the Deposition of Thin Films von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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Stresses in Silicon Dioxide Films Deposited from Dielectric Targets: Results of Atomistic Modelling von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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Large-Scale Atomistic Simulation of the Structure of ZnO Films von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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Anisotropy of glancing angle deposited films: results of atomistic simulation von Grigoriev, F V, Sulimov, V B, Tikhonravov, A V

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High-performance Atomistic Simulation of the Deposition of $$\mathbf{TiO}_{\mathbf{2}}{\mathbf{-}}\mathbf{SiO}_{\mathbf{2}}$$ Thin Films von Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.

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Molecular Dynamics Simulation of Heat Transfer and Stresses in Thin Films Caused by a Short Laser Pulse von Grigoriev, F. V., Zhupanov, V. P., Chesnokov, D. A., Sulimov, V. B., Tikhonravov, A. V.

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Atomistic Simulation of Stresses in Growing Silicon Dioxide Films von Grigoriev, Fedor V., Sulimov, Vladimir B., Tikhonravov, Alexander V.

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