SF6 plasma etching of silicon nanocrystals von Liptak, R W, Devetter, B, Thomas III, J H, Kortshagen, U, Campbell, S A

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Thermally induced stress hysteresis and co-efficient of thermal expansion changes in nanoporous SiO2 von Soh, Martin T K, Thurn, Jeremy, Thomas, J H, Talghader, Joseph J

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SF 6 plasma etching of silicon nanocrystals von Liptak, R W, Devetter, B, Thomas III, J H, Kortshagen, U, Campbell, S A

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Native oxide removal during chlorine reactive ion etching of silicon in an rf diode reactor von THOMAS, J. H, HAMMER, L. H

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Dielectric breakdown of Ag2S in the Au-Ag2S-Ag system von Sharma, S. P., Thomas III, J. H.

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Magnetic multipole-based reactive ion etching reactor von SINGH, B, THOMAS, J. H, PATEL, V

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X-ray photoelectron spectroscopy analysis of changes in InP and InGaAs surfaces exposed to various plasma environments von THOMAS, J. H. III, KAGANOWICZ, G, ROBINSON, J. W

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X-ray photoelectron spectroscopy study of hydrogen plasma interactions with a tin oxide surface von Thomas III, J. H.

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Hydrogen plasma interactions with tin oxide surfaces von Schade, H., E. Smith, Z, Thomas, J.H., Catalano, A.

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Corrosion inhibitors for aluminum films von ZANZUCCHI, P. J, THOMAS, J. H. III

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The effect of mineral acids on Y2O2S surface chemistry von LABIB, M. E, THOMAS, J. H. III

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X-ray photoelectron spectroscopy and surface charge build-up used to study residue on aluminum contacts on integrated circuits von Thomas III, J. H., Bryson III, C. E., Pampalone, T. R.

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The effect of thin titanium oxide layers on the wettability of thin-film nickel metallization von Thomas Iii, J. H., Hitch, T. T.

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An X-ray photoelectron spectroscopy study of CF4/H2 reactive ion etching residue on silicon von THOMAS, J. H. III, CHUN MU, X, FONASH, S. J

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Elastic electron backscattering for quantitative elemental analysis of laser diode structures von Szostak, D. J., Thomas III, J. H.

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Analysis of ion induced surface damage on silicon etched in a CF4 plasma von THOMAS, J. H. III, MCGINN, J. T, HAMMER, L. H

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Backscattered electron imaging with scanning Auger electron spectroscopy von Thomas, J. H.

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The effect of heat treatment on sulfur in an electrically-conductive carbon black von Labib, M.E., Thomas, J.H., Embert, D.D.

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Toward polymer upcycling—adding value and tackling circularity von Korley, LaShanda T. J., Epps, Thomas H., Helms, Brett A., Ryan, Anthony J.

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The use of plasmon-loss peaks in studying the epitaxial silicon on alumina interface von Thomas III, J. H., Hofmann, S.

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