Thickness Dependence of Hole Mobility in Ultrathin SiGe-Channel p-MOSFETs von Chleirigh, C.N., Theodore, N.D., Fukuyama, H., Mure, S., Ehrke, H.-U., Domenicucci, A., Hoyt, J.L.

Volltext

Failure mechanisms of pure silver, pure aluminum and silver–aluminum alloy under high current stress von Misra, E., Theodore, N.D., Mayer, J.W., Alford, T.L.

Volltext

Failure mechanisms of silver and aluminum on titanium nitride under high current stress von Misra, E., Marenco, C., Theodore, N.D., Alford, T.L.

Volltext

The effect of sputtering pressure on electrical, optical and structure properties of indium tin oxide on glass von Elhalawaty, S., Sivaramakrishnan, K., Theodore, N.D., Alford, T.L.

Volltext

Passivation of Cu via refractory metal nitridation in an ammonia ambient von Adams, Daniel, Alford, T.L., Theodore, N.D., Russell, S.W., Spreitzera, R.L., Mayer, J.W.

Volltext

Thermal stability of tungsten–titanium diffusion barriers for silver metallization von Bhagat, S.K., Theodore, N.D., Alford, T.L.

Volltext

ECS Journal of Solid State Science and Technology 4: Advances in 2D/3D printing of functional nanomaterials and their Applications von Choi, J.Y, Das, S, Theodore, N.D, Kim, I, Honsberg, C, Choi, H.W, Alford, T.L

Volltext

Nanocrystalline Si formation in the a-Si/Al system on polyimide and silicon dioxide substrates von Alford, T.L., Shetty, P.K., Theodore, N.D., Tile, N., Adams, D., Mayer, J.W.

Volltext

Evaluation of diffusion barrier and electrical properties of tantalum oxynitride thin films for silver metallization von Misra, E., Wang, Y., Theodore, N.D., Alford, T.L.

Volltext

Investigation of thermal stability, phase formation, electrical, and microstructural properties of sputter-deposited titanium aluminide thin films von Kim, H.C., Theodore, N.D., Gadre, K.S., Mayer, J.W., Alford, T.L.

Volltext

Nitrogen-Implanted Silicon Oxynitride: A Coating for Suppressing Field Emission From Stainless Steel Used in High-Voltage Applications von Theodore, N.D., Holloway, B.C., Manos, D.M., Moore, R., Hernandez, C., Tong Wang, Dylla, H.F.

Volltext

Formation and characterization of silicon films on flexible polymer substrates von Shetty, P.K., Theodore, N.D., Ren, J., Menendez, J., Kim, H.C., Misra, E., Mayer, J.W., Alford, T.L.

Volltext

Microstructure and stability of sputtered titanium aluminides on SiO 2 von Kim, H.C., Theodore, N.D., Gadre, K.S., Alford, T.L.

Volltext

Kinetics of amorphous silicon dissolution into aluminum layers von Shetty, P.K., Theodore, N.D., Mayer, J.W., Alford, T.L.

Volltext

Microstructure and stability of sputtered titanium aluminides on SiO2 von KIM, H. C, THEODORE, N. D, GADRE, K. S, ALFORD, T. L

Volltext

Dopant activation and strain relaxation in P-implanted metastable pseudomorphic Ge 0.12Si 0.88 grown on Si(100) von Lie, D.Y.C., Theodore, N.D., Song, J.H.

Volltext

A study of the microstructure and surface topography of aluminum thin films containing 1. 5 weight percent copper using hot-stage SEM and TEM von Cao, B, Carrejo, J., Theodore, N.D.

Volltext

Segregation of Cu in Cu (Ti) alloys during nitridation in NH 3 von Adams, Daniel, Alford, T.L., Theodore, N.D., Russell, S.W.

Volltext

Influence of interfacial copper on the room temperature oxidation of silicon von Alford, T. L., Jaquez, E. J., Theodore, N. David, Russell, S. W., Diale, M., Adams, D., Anders, Simone

Volltext

Dopant activation and strain relaxation in P-implanted metastable pseudomorphic Ge0.12Si0.88 grown on Si(100) von LIE, D. Y. C, THEODORE, N. D, SONG, J. H

Volltext