Elemental Composition, Topography and Wettability of Pb x Sn 1 - x S Thin Films von Tashlykov, I.S., Turavets, A.I., Gremenok, V.F., Żukowski, P.

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Surface Composition of CIS Compound Affected by Xe⁺ Irradiation von Tashlykov, I.S., Zukowski, P., Silvanovich, D.A., Gremenok, V.F.

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Elastomer surface modification by means of SIAD of metal-based layers von Tashlykov, I.S, Kasperovich, A.V, Wolf, G.K

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Radiation damage of Si wafers modified by means of thin layer ion assisted deposition von Tashlykov, I.S., Bobrovich, O.G.

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A model of oxide layer growth on Ag + and Pt + ion implanted nickel anode in aqueous alkaline solution von Tashlykov, I.S.

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Elastomer treatment by arc metal deposition assisted with self-ion irradiation von Tashlykov, I.S, Kasperovich, V.I, Shadrukhin, M.G, Kasperovich, A.V, Wolf, G.K, Wesch, W

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Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition von Vishnyakov, V., Wirth, A., Tashlykov, I.S.

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Evaluation of Coatings Produced by Low-Energy Ion Assisted Deposition of Co on Silicon von Carter, G., Colligon, J.S., Tashlykov, I.S.

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Radiation Damage and Amorphization Mechanisms in Xe+ Irradiated CuInSe2 Single Crystals von Hill, A.E., Tashlykov, I.S., Tomlinson, R.D., Yakushev, M.V., Pilkington, R.D.

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Deposition of metal layers on carbon assisted with the same metal's ion radiation von Tashlykov, I.S., Bobrovich, O.G., Palchekh, V.Ch, Tuljev, V.V., Alov, N.V., Kulikauskas, V.S., Wolf, G.K.

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On the efficiency of deposited energy density for ion beam mixing processes with ions implanted during and after thin metal film deposition von Tashlykov, I.S., Belyi, I.M., Bobrovich, O.G., Kalbitzer, S., Meyer, O., Wolf, G.K., Enders, B.

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Improvement of physical and chemical properties of steel implanted with Cr +, Ti +, Si + ions von Tashlykov, I.S., Belyi, I.M., Bobrovich, O.G., Tuljev, V.V., Shadruchin, M.G., Kolotyrkin, V.I., Tomashpolskii, M.Yu, Kulikauskas, V.S.

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Backscattering measurements of P + implanted GaAs crystals von Tashlykov, I.S.

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Effect of ion implantation on the oxygen overpotential of Ni Anodes von Akano, U., Davies, J.A., Smeltzer, W.W., Tashlykov, I.S., Thompson, D.A.

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METHOD OF OBTAINING SILICON CARBIDE LAYERS von GUMANSKIJ G.A.,SU, BELYJ I.M.,SU, SOLOVEV V.S.,SU, TISHKOV V.S.,SU, TASHLYKOV I.S.,SU

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