Swelling Analysis of Methacrylate Polymers in Aqueous Alkaline Developer von Toriumi, Minoru, Ohfuji, Takeshi, Endo, Masayuki, Morimoto, Hiroaki

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Chromium fluoride attenuated phase-shifting mask for argon fluoride excimer laser lithography von USHIODA, J, SEKI, Y, MAEDA, K, OHFUJI, T, TANABE, H

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Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists von Kanzaki, Kenichi, Ohfuji, Takeshi, Sasago, Masaru, Tagawa, Seiichi

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Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography von Kanzaki, Kenichi, Ohfuji, Takeshi, Sasago, Masaru, Tagawa, Seiichi

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Study of the Bottom Antireflective Coating Process Using a High-Transparency Resist for ArF Excimer Laser Lithography von Kishimura, Shinji, Takahashi, Makoto, Ohfuji, Takeshi, Sasago, Masaru

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Effects of Photoacid Generator Concentration and Post-Exposure Bake Temperature on Dissolution Behavior of ArF Excimer Laser Resists von Kanzaki, Kenichi, Ohfuji, Takeshi, Tagawa, Seiichi

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Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists von Iwasa, Shigeyuki, Maeda, Katsumi, Nakano, Kaichiro, Ohfuji, Takeshi, Hasegawa, Etsuo

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Characterization of Chemically Amplified Resists with "Acid Amplifier" for 193 nm Lithography von Ohfuji, Takeshi, Takahashi, Makoto, Sasago, Masaru, Noguchi, Soh, Ichimura, Kunihiro

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Novel Resist Materials Using Acid Amplifiers. Part II von Noguchi, Soh, Arimitsu, Koji, Ichimura, Kunihiro, Kudo, Kazuaki, Ohfuji, Takeshi, Sasago, Masaru

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193nm Lithography With Novel Highly Transparent Acid Amplifier for Chemically Amplified Resists von Naito, Takuya, Ohfuji, Takeshi, Endo, Masayuki, Morimoto, Hiroaki, Arimitsu, Koji, Ichimura, Kunihiro

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Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography von Keisuke Nakazawa, Keisuke Nakazawa, Masaya Uematsu, Masaya Uematsu, Toshio Onodera, Toshio Onodera, Kazuya Kamon, Kazuya Kamon, Tohru Ogawa, Tohru Ogawa, Shigeyasu Mori, Shigeyasu Mori, Makoto Takahashi, Makoto Takahashi, Takeshi Ohfuji, Takeshi Ohfuji, Hiroshi Ohtsuka, Hiroshi Ohtsuka, Masaru Sasago, Masaru Sasago

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Dissolution Rate Analysis of ArF Resists Based on the Percolation Model von Yamaguchi, Atsuko, Takahashi, Makoto, Kishimura, Shinji, Matsuzawa, Nobuyuki, Ohfuji, Takeshi, Tanaka, Tomoaki, Tagawa, Seiichi, Sasago, Masaru

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Synthesis and Characteristics of a Novel Acid Amplifier with a Low Absorbance at 193nm von Park, Sang-Wook, Arimitsu, Koji, Ichimura, Kunihiro, Ohfuji, Takeshi

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Reversible Complexation Mediated Living Radical Polymerization (RCMP) Using Organic Catalysts von Goto, Atsushi, Suzuki, Tomohiro, Ohfuji, Haruki, Tanishima, Miho, Fukuda, Takeshi, Tsujii, Yoshinobu, Kaji, Hironori

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Cyclization Reaction in Acrylonitrile-Contained Acrylic Copolymers and Its Possible Application for the Improvement of Dry Etch Resistance for Photoresists von Zhao, Wenwei, Sakurai, Yusuke, Ohfuji, Takeshi, Sasago, Masaru, Tagawa, Seiichi

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Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit von Matsuzawa, Nobuyuki N., Takechi, Satoshi, Ohfuji, Takeshi, Kuhara, Koichi, Mori, Shigeyasu, Endo, Masayuki, Kamon, Kazuya, Morisawa, Taku, Yamaguchi, Atsuko, Sasago, Masaru

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Intermediate-depth earthquakes linked to localized heating in dunite and harzburgite von Ohuchi, Tomohiro, Lei, Xinglin, Ohfuji, Hiroaki, Higo, Yuji, Tange, Yoshinori, Sakai, Takeshi, Fujino, Kiyoshi, Irifune, Tetsuo

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chemically Amplified Si-contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and its Application to Bi-Layer Resist Process von Morisawa, Taku, Matsuzawa, Nobuyuki, Mori, Shigeyasu, Kaimoto, Yuko, Endo, Masayuki, Kuhara, Koichi, Ohfuji, Takeshi, Sasago, Masaru

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Bilayer resists process for ArF lithography von Morisawa, Taku, Matsuzawa, Nobuyuki N., Mori, Sigeyasu, Kaimoto, Yuko, Endo, Masayuki, Ohfuji, Takeshi, Kuhara, Koichi, Sasago, Masaru

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High-pressure generation using double stage micro-paired diamond anvils shaped by focused ion beam von Sakai, Takeshi, Yagi, Takehiko, Ohfuji, Hiroaki, Irifune, Tetsuo, Ohishi, Yasuo, Hirao, Naohisa, Suzuki, Yuya, Kuroda, Yasushi, Asakawa, Takayuki, Kanemura, Takashi

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