Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of haf... von Smith, Ryan C., Ma, Tiezhong, Hoilien, Noel, Tsung, Lancy Y., Bevan, Malcolm J., Colombo, Luigi, Roberts, Jeffrey, Campbell, Stephen A., Gladfelter, Wayne L.

Volltext

Morphology of TiO2 Aerogels. 1. Electron Microscopy von Zhu, Zhu, Tsung, Lancy Y, Tomkiewicz, Micha

Volltext

Chemical etch solution and technique for imaging a device's shallow junction profile von TSUNG LANCY Y, MATHESON DOUG, ANCISO ADOLFO

Volltext bestellen

Chemical etch solution and technique for imaging a device's shallow junction profile von Tsung, Lancy Y, Anciso, Adolfo, Matheson, Doug

Volltext bestellen

Chemical etch solution and technique for imaging a device's shallow junction profile von TSUNG LANCY Y, MATHESON DOUG, ANCISO ADOLFO

Volltext bestellen

Chemical etch solution and technique for imaging a device's shallow junction profile von TSUNG LANCY Y, MATHESON DOUG, ANCISO ADOLFO

Volltext bestellen

Method to reduce source-line resistance in flash memory with sti von MEHRAD FREIDOON, TSUNG LANCY Y, AMBROSE THOMAS M

Volltext bestellen

Characterization of reactions at titanium/nickel silicide interface using X-ray photoelectron spectroscopy and transmission electron microscopy von Zhao, Jin, Lu, Jiong-Ping, Xu, Yu-Qing, Kuan, Yu-Ji R, Tsung, Lancy

Volltext