Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses von Tseng, Yu-Fang, Liao, Pin-Chia, Chen, Po-Hsiung, Gau, Tsai-Sheng, Lin, Burn-Jeng, Chiu, Po-Wen, Liu, Jui-Hsiung

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Synthesis of pentameric chlorotin carboxylate clusters for high resolution EUV photoresists under small doses von Li, Cheng-Dun, Lin, Ting-An, Chen, Po-Hsiung, Gau, Tsai-Sheng, Lin, Burn-Jeng, Chiu, Po-Wen, Liu, Jui-Hsiung

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X-ray diffraction studies of miscut crystal surfaces and overlayers: a dynamical diffraction approach von Kau, Chung-Pao, Gau, Tsai-Sheng, Chang, Shih-Lin

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Dynamical calculation of crystal truncation rods for surfaces and interfaces using a Cartesian coordinate transformation technique von Chien, Hung-Chun, Gau, Tsai-Sheng, Chang, Shih-Lin, Stetsko, Yuri P.

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Solving the intensity problem of surface X-ray diffraction using dynamical theory von Gau, Tsai-Sheng, Chang, Shih-Lin

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Determination of the interface structural morphology from grazing-incidence X-ray diffraction data using dynamical theory von Gau, Tsai-Sheng, Chien, Hung-Chun, Chang, Shih-Lin, Li, Mei-Yen, Wu, Maw-Kuen

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Electron paramagnetic resonance of Cu2+ in KHCO3 crystals von Gau, Tsai-Sheng, Yu, Jiang-Tsu

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PELLICLE ASSEMBLY AND METHOD OF MAKING SAME von Gau, Tsai-Sheng, Lee, Hsin-Chang, Chen, Li-Jui, Lien, Ta-Cheng, Hsu, Pei-Cheng, Lin, Chin-Hsiang

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Pellicle assembly and method of making same von Gau, Tsai-Sheng, Lee, Hsin-Chang, Chen, Li-Jui, Lien, Ta-Cheng, Hsu, Pei-Cheng, Lin, Chin-Hsiang

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METHODS FOR INTEGRATED CIRCUIT DESIGN AND FABRICATION von Gau, Tsai-Sheng, Ou, Tsong-Hua, Chang, Shih-Ming, Huang, Wen-Chun, Lai, Chih-Ming, Liu, Ru-Gun, Hsieh, Ken-Hsien

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MULTI-LAYER PELLICLE MEMBRANE von Gau, Tsai-Sheng, Lee, Hsin-Chang, Lien, Ta-Cheng, Hsu, Pei-Cheng, Lin, Chin-Hsiang

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VIA CONNECTION TO A PARTIALLY FILLED TRENCH von Shue, Shau-Lin, Gau, Tsai-Sheng, Bao, Tien-I, Chang, Shih-Ming, Lai, Chih-Ming, Liu, Ru-Gun, Lee, Chung-Ju

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PHOTORESIST AND FORMATION METHOD THEREOF von CHEN, Po-Hsiung, LIU, Jui-Hsiung, LIN, Burn Jeng, WU, Yan-Ru, GAU, Tsai-Sheng, LIN, Ting-An, TSAI, Han-Tsung

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PHOTORESIST AND FORMATION METHOD THEREOF von CHEN, Po-Hsiung, SHIH, Ting-An, LIU, Jui-Hsiung, TSENG, Yu-Fang, LIN, Burn Jeng, GAU, Tsai-Sheng, LIAO, Pin-Chia, LIN, Ting-An, CHIU, Po-Wen

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PHOTORESIST AND FORMATION METHOD THEREOF von CHEN, Po-Hsiung, LIU, Jui-Hsiung, TSENG, Yu-Fang, LIN, Burn Jeng, GAU, Tsai-Sheng, LIAO, Pin-Chia, CHIU, Po-Wen

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Via connection to a partially filled trench von Shue, Shau-Lin, Gau, Tsai-Sheng, Bao, Tien-I, Chang, Shih-Ming, Lai, Chih-Ming, Liu, Ru-Gun, Lee, Chung-Ju

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Method for coloring circuit layout and system for performing the same von Gau, Tsai-Sheng, Chiang, Chia-Ping, Chih, Ming-Hui, Wang, Tsung-Yu, Cheng, Wen-Li, Yin, Hui En, Huang, Wen-Chun, Liu, Ru-Gun, Chang, Ya-Ting, Hsu, Chih-Wei, Wu, Ping-Chieh

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PELLICLE ASSEMBLY AND METHOD OF MAKING SAME von Gau, Tsai-Sheng, Lee, Hsin-Chang, Chen, Li-Jui, Lien, Ta-Cheng, Hsu, Pei-Cheng, Lin, Chin-Hsiang

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Critical dimension error analysis for 0.13 μm photolithography and beyond von Gau, Tsai-Sheng, Yen, Anthony, Chen, Jeng-Horng, Yu, Shinn-Sheng, Chen, Chun-Kuang, Ke, Chih-Ming, Lin, Burn J., Wang, Ping-Ting C.

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METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DISTORTIONS von Chen, Chun-Kuang, Shue, Shau-Lin, Gau, Tsai-Sheng, Wu, Chia-Tien, Yu, Ta-Ching, Yen, Yung-Sung, Chen, Kuei-Shun, Liu, Ru-Gun, Wu, Yung-Hsu, Lee, Chung-Ju

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