Assessing the hydrologic restoration of an urbanized area via an integrated distributed hydrological model von Trinh, D. H, Chui, T. F. M

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TA4AlC3 : Phase determination, polymorphism and deformation von EKLUND, P, PALMQUIST, J.-P, HÖWING, J, TRINH, D. H, EL-RAGHY, T, HÖGBERG, H, HULTMAN, L

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Direct current magnetron sputtering deposition of nanocomposite alumina — zirconia thin films von Trinh, D.H., Kubart, T., Nyberg, T., Ottosson, M., Hultman, L., Högberg, H.

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The influences of surface treatment and gas annealing conditions on the inversion behaviors of the atomic-layer-deposition Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacito... von Trinh, H. D., Chang, E. Y., Wu, P. W., Wong, Y. Y., Chang, C. T., Hsieh, Y. F., Yu, C. C., Nguyen, H. Q., Lin, Y. C., Lin, K. L., Hudait, M. K.

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Phase transformation in κ- and γ-Al2O3 coatings on cutting tool inserts von Trinh, D.H., Back, K., Pozina, G., Blomqvist, H., Selinder, T., Collin, M., Reineck, I., Hultman, L., Högberg, H.

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Nanocomposite Al2O3-ZrO2 thin films grown by reactive dual radio-frequency magnetron sputtering von TRINH, D. H, OTTOSSON, M, COLLIN, M, REINECK, I, HULTMAN, L, HÖGBERG, H

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Electrical Characterization of Al2O3/n-InAs Metal-Oxide-Semiconductor Capacitors With Various Surface Treatments von TRINH, H. D, BRAMMERTZ, G, IWAI, H, CHANG, E. Y, KUO, C. I, LU, C. Y, LIN, Y. C, NGUYEN, H. Q, WONG, Y. Y, TRAN, B. T, KAKUSHIMA, K

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Sensor classification for the fault detection and isolation, a structural approach von Commault, C., Dion, J. M., Trinh, D. H., Do, T. H.

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In0.5Ga0.5As-Based Metal - Oxide - Semiconductor Capacitor on GaAs Substrate Using Metal - Organic Chemical Vapor Deposition von Nguyen, H. Q., Trinh, H. D., Chang, E. Y., Lee, C. T., Shin Yuan Wang, Yu, H. W., Hsu, C. H., Nguyen, C. L.

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hbox{In}_{0.5}\hbox{Ga}_{0.5}\hbox{As}$-Based Metal–Oxide–Semiconductor Capacitor on GaAs Substrate Using Metal–Organic Chemical Vapor Deposition von Nguyen, H. Q., Trinh, H. D., Chang, E. Y., Lee, C. T., Wang, Shin Yuan, Yu, H. W., Hsu, C. H., Nguyen, C. L.

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[Formula Omitted]-Based Metal-Oxide-Semiconductor Capacitor on GaAs Substrate Using Metal-Organic Chemical Vapor Deposition von Nguyen, H. Q, Trinh, H. D, Chang, E. Y, Lee, C. T, Wang, Shin Yuan, Yu, H. W, Hsu, C. H, Nguyen, C. L

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InMotion hybrid racecar: F1 performance with LeMans endurance von Jacob, J, Colin, J.A, Montemayor, H, Sepac, D, Trinh, H.D, Voorderhake, S.F, Zidkova, P, Paulides, J.J.H, Borisaljevic, A, Lomonova, E.A

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Electrical Characterization of \hbox \hbox/n-InAs Metal-Oxide-Semiconductor Capacitors With Various Surface Treatments von Trinh, H D, Brammertz, G, Chang, E Y, Kuo, C I, Lu, C Y, Lin, Y C, Nguyen, H Q, Wong, Y Y, Tran, B T, Kakushima, K, Iwai, H

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Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3–ZrO2 thin films von Trinh, D. H., Högberg, H., Andersson, J. M., Collin, M., Reineck, I., Helmersson, U., Hultman, L.

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Effect of Nitridation on the Regrowth Interface of AlGaN/GaN Structures Grown by Molecular Beam Epitaxy on GaN Templates von Wong, Yuen-Yee, Huang, Wei-Ching, Trinh, Hai-Dang, Yang, Tsung-Hsi, Chang, Jet-Rung, Chen, Micheal, Chang, Edward Yi

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Phase identification in γ- and κ-alumina coatings by cathodoluminescence von Pozina, G., Trinh, D.H., Högberg, H., Collin, M., Reineck, I., Hultman, L.

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(Invited) Passivation of Al 2 O 3 /n, p-In 0.53 Ga 0.47 as Interfaces: Influence of Plasma Enhanced Atomic Layer Deposition Aluminum Nitride with Various Plasma Powers von Chang, Edward Yi, Luc, Q H, Trinh, H D, Lin, Y C

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Phase identification in g- and k-alumina coatings by cathodoluminescence von Pozina, G, Trinh, D H, Hogberg, H, Collin, M, Reineck, I, Hultman, L

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Nanocomposite Al 2 O 3 -ZrO 2 thin films grown by reactive dual radio-frequency magnetron sputtering von Trinh, David Huy, Ottosson, M., Collin, M., Reineck, I., Hultman, Lars, Högberg, Hans

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Experiments and modeling of dual reactive magnetron sputtering using two reactive gases von Kubart, T., Trinh, D. H., Liljeholm, L., Hultman, L., Högberg, H., Nyberg, T., Berg, S.

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